×

Methods of forming nano-scale electronic and optoelectronic devices using non-photolithographically defined nano-channel templates and devices formed thereby

  • US 20030010971A1
  • Filed: 06/24/2002
  • Published: 01/16/2003
  • Est. Priority Date: 06/25/2001
  • Status: Active Grant
First Claim
Patent Images

1. A method of forming a vertical nano-scale electronic device, comprising the steps of:

  • forming a substrate comprising a semiconductor layer and a substrate insulating layer on the semiconductor layer;

    forming an etching template having a first array of non-photolithographically defined nano-channels extending therethrough, on the substrate insulating layer;

    selectively etching the substrate insulating layer to define a second array of nano-channels therein, using the etching template as an etching mask; and

    forming an array of semiconductor nano-pillars that extend in the second array of nano-channels and have an average diameter in a range between about 8 nm and about 50 nm.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×