Light deflector, method of manufacturing light deflector, optical device using light deflector, and torsion oscillating member
First Claim
1. A light deflector in which both ends of a movable plate is supported to a support substrate by an elastic support portion, a reflection surface is formed on one surface of the movable plate, and the movable plate is torsion-oscillated about a torsion axis of the elastic support portion as a center to deflect an incident light that enters the reflection surface, wherein a recessed portion is formed on at least one side surface of both sides, which is a surface on which the reflection surface is not formed, and between which the torsion axis of the elastic support portion is interposed.
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Accused Products
Abstract
There is disclosed a light deflector in which both ends of a movable plate is supported to a support substrate by an elastic support portion, a reflection surface is formed on one surface of the movable plate, and the movable plate is torsion-oscillated about a torsion axis of the elastic support portion as a center to deflect an incident light that enters the reflection surface, wherein a recessed portion is formed on at least one side surface of both sides, which is a surface on which the reflection surface is not formed, and between which the torsion axis of the elastic support portion is interposed.
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Citations
31 Claims
- 1. A light deflector in which both ends of a movable plate is supported to a support substrate by an elastic support portion, a reflection surface is formed on one surface of the movable plate, and the movable plate is torsion-oscillated about a torsion axis of the elastic support portion as a center to deflect an incident light that enters the reflection surface, wherein a recessed portion is formed on at least one side surface of both sides, which is a surface on which the reflection surface is not formed, and between which the torsion axis of the elastic support portion is interposed.
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16. A light deflector in which both ends of a movable plate is supported to a support substrate by an elastic support portion, a reflection surface is formed on one surface of the movable plate, and the movable plate is torsion-oscillated about a torsion axis of the elastic support portion as a center to deflect an incident light that enters the reflection surface, wherein at least one of surfaces, which is a surface of the movable plate opposite to the reflection surface, and between which the torsion axis of the elastic support portion is interposed, is made a step configuration so as to gradually outwardly reduce the thickness of the movable plate.
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19. A light deflector in which both ends of a movable plate is supported to a support substrate by an elastic support portion, a reflection surface is formed on one surface of the movable plate, and the movable plate is torsion-oscillated about a torsion axis of the elastic support portion as a center to deflect an incident light that enters the reflection surface, wherein a through-hole is formed on at least one of surfaces between which the torsion axis of the elastic support portion of the movable plate is interposed and in the periphery of the effective reflection region of the movable plate.
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24. A method of manufacturing a light deflector, comprising the steps of:
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forming mask layers on both surfaces of a silicon substrate;
removing the mask layer on a surface where a reflection surface is formed, with the mask layer corresponding to the outer configuration portions of a support substrate, an elastic support portion and a movable plate being left unremoved;
removing the mask layer on an opposite side to the surface where the reflection surface is formed, with the mask layer corresponding to the outer configuration portions of a support substrate, an elastic support portion and a movable plate being left unremoved, and removing the mask layer on the recessed portion of the movable plate;
emerging the silicon substrate in an alkali aqueous solution and conducting an anisotropic etching process to separate the silicon substrate into the support substrate, the elastic support portion and the movable plate, and forming a recessed portion in one surface of the movable plate;
removing the mask layer on the silicon substrate; and
forming a reflection film on the surface on which the reflection surface of the movable plate is formed.
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27. A method of manufacturing a light deflector, comprising the steps of:
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forming a mask layer on one surface of a silicon substrate;
forming a reflection film on a portion of the other surface of the silicon substrate on which a reflection surface is formed;
removing the mask layer formed on the silicon substrate portions where a support substrate, an elastic support portion and a movable plate are formed being left unremoved, and etching the regions of the silicon substrate, with the regions the support substrate, the elastic support portion and the movable portion being left unetched, to a given depth through a dry etching process;
repeatedly conducting the removal of the recessed portion of the mask layer formed on the silicon substrate and the etching of the given depth due to the dry etching of the silicon substrate in accordance with the number of recessed portions formed on the movable plate in a direction crossing the torsion axis of the elastic support portion, to thereby separate the silicon substrate into the support substrate, the elastic support portion and the movable plate, and to form on the movable plate a plurality of recessed portions that gradually outwardly increase its diameter and its depth from the torsion axis; and
removing the mask layer of the silicon substrate.
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28. A method of manufacturing a light deflector, comprising the steps of:
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forming a mask layer on one surface of a silicon substrate;
forming a reflection film on a portion of the other surface of the silicon substrate on which a reflection surface is formed;
removing the mask layer formed on the silicon substrate portions where a support substrate, an elastic support portion and a movable plate are formed being left unremoved, and etching the regions of the silicon substrate, among the regions the support substrate, the elastic support portion and the movable portion being left unetched, to a given depth through a dry etching process;
repeatedly conducting the removal of a flat portion of a step configuration portion of the mask layer formed on the silicon substrate and the etching of the given depth due to the dry etching of the silicon substrate in accordance with the number of step configurations formed on the movable plate, to thereby separate the silicon substrate into the support substrate, the elastic support portion and the movable plate, and to form on the movable plate step portions that gradually outwardly increase its diameter and its depth from the torsion axis; and
removing the mask layer of the silicon substrate.
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29. A torsion oscillating member comprising a movable plate, a shaft and a support substrate, in which the movable plate is supported to the support substrate by the shaft connected to both ends of the movable plate, and the movable plate is torsion-oscillatable about the shaft as a center, wherein a recess is formed on at least one region of both sides between which a region on the extension of the shaft is interposed on one face of the movable plate.
Specification