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Method for fabricating a through-wafer optical MEMS device having an anti-reflective coating

  • US 20030021004A1
  • Filed: 12/19/2001
  • Published: 01/30/2003
  • Est. Priority Date: 12/19/2000
  • Status: Abandoned Application
First Claim
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1. A method for fabricating an optical MEMS device comprising the steps of:

  • (a) providing an optically transmissive substrate;

    (b) depositing an antireflective coating on a surface of the substrate to enable an optical signal to be transmitted along a path directed through the antireflective coating and the substrate; and

    (c) forming a movable, actuatable microstructure on the substrate, whereby actuation of the microstructure causes the microstructure to interact with the optical signal.

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