×

Reproduction of relief patterns

  • US 20030025227A1
  • Filed: 07/30/2002
  • Published: 02/06/2003
  • Est. Priority Date: 08/02/2001
  • Status: Abandoned Application
First Claim
Patent Images

1. A method of replicating a surface, the method comprising the steps of:

  • a. providing a rigid substrate having positioning features;

    b. providing a plurality of relief structures each having a relief geometry and a positioning feature complementary to the substrate positioning features;

    c. joining the relief structures to the substrate by mating the substrate positioning features and the relief-structure positioning features, thereby forming a relief master; and

    d. replicating the relief master.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×