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Corrosion resistant coating for semiconductor processing chamber

  • US 20030029563A1
  • Filed: 08/10/2001
  • Published: 02/13/2003
  • Est. Priority Date: 08/10/2001
  • Status: Abandoned Application
First Claim
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1. A substrate processing chamber having at least one component bearing a rare earth-containing coating bound to a parent material by an intervening adhesion layer, such that the component exhibits resistance to etching in a plasma environment.

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