×

An Apparatus For Annealing Substrates In Physical Vapor Deposition Systems

  • US 20030029715A1
  • Filed: 07/25/2001
  • Published: 02/13/2003
  • Est. Priority Date: 07/25/2001
  • Status: Abandoned Application
First Claim
Patent Images

1. A system for processing a substrate, comprising:

  • a load lock chamber;

    an intermediate substrate transfer region connected to the load lock chamber, the intermediate substrate transfer region comprising a first substrate transfer chamber and a second substrate transfer chamber, wherein the first substrate transfer chamber is coupled to the load lock chamber and the second substrate transfer chamber is coupled to the first substrate transfer chamber;

    a physical vapor deposition (PVD) processing chamber disposed on the first substrate transfer chamber; and

    an annealing chamber disposed on the second substrate transfer chamber.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×