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Potential masking systems and methods for combinatorial library synthesis

  • US 20030032205A1
  • Filed: 08/27/2002
  • Published: 02/13/2003
  • Est. Priority Date: 10/02/1996
  • Status: Abandoned Application
First Claim
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1. An apparatus for applying components of one or more source materials to spatially addressable, predefined locations onto a substrate, the apparatus comprising:

  • at least one source material; and

    a potential assembly for applying a spatially varying potential across said substrate, said spatially varying potential causing components of said source material to deposit at said spatially addressable, predefined locations.

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