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Graded thin films

  • US 20030032281A1
  • Filed: 09/23/2002
  • Published: 02/13/2003
  • Est. Priority Date: 03/07/2000
  • Status: Active Grant
First Claim
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1. A method of forming a liner layer with a varying composition in a damascene trench, comprising:

  • placing a substrate in a reaction chamber;

    introducing first metal and nitrogen vapor phase reactants in alternate and temporally separated pulses to the substrate in a plurality of atomic layer deposition (ALD) cycles; and

    introducing varying amounts of a second metal vapor phase reactant to the substrate during said plurality of deposition cycles.

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