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Optical monitoring and control system and method for plasma reactors

  • US 20030038112A1
  • Filed: 09/30/2002
  • Published: 02/27/2003
  • Est. Priority Date: 03/30/2000
  • Status: Active Grant
First Claim
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1. A method for monitoring plasma processing of a substrate with a surface in a plasma reactor having an electrode, the method comprising the steps of:

  • a) positioning the substrate in the plasma reactor;

    b) creating a plasma in the plasma reactor;

    c) monitoring optical emissions emanating from a plurality of different regions of the plasma, which regions are spaced apart in a direction parallel to the surface of the substrate during plasma processing of the substrate;

    d) determining an integrated power spectrum for each of said different plasma regions and comparing each of said integrated power spectra to a predetermined value.

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