×

Substrate processing system for performing exposure process in gas atmosphere

  • US 20030041971A1
  • Filed: 08/23/2002
  • Published: 03/06/2003
  • Est. Priority Date: 08/28/2001
  • Status: Abandoned Application
First Claim
Patent Images

1. A substrate processing system which sprays exposure process gas onto a substrate disposed within a chamber, the substrate processing system comprising:

  • the chamber having at least one gas inlet and at least one gas outlets;

    a gas introducing means which introduces the exposure process gas into the chamber via the gas inlet; and

    a gas distributing means;

    wherein the gas distributing means separates an inner space of the chamber into a first space into which the exposure process gas is introduced via the gas inlet and a second space in which the substrate is disposed;

    the gas distributing means has a plurality of openings via which the first space and the second space communicate with each other; and

    the gas distributing means introduces the exposure process gas introduced into the first space into the second space via the openings.

View all claims
  • 3 Assignments
Timeline View
Assignment View
    ×
    ×