Method and apparatus for detecting a wafer's posture on a susceptor

• US 20030042419A1
• Filed: 12/20/2000
• Published: 03/06/2003
• Est. Priority Date: 12/21/1999
• Status: Abandoned Application

• Current Assignee: Toshiba Kikai Kabushiki Kaisha
• Original Assignee: Toshiba Kikai Kabushiki Kaisha
• Inventors: Kobayashi, Takehiko, Katsumata, Hirohumi
• Application Number:
  US09/740,030
• Publication Number:
  US 20030042419A1
• Time in Patent Office: Days
• US Class Current: 250/339.11
• CPC Class Codes: C30B 25/16 Controlling or regulating controlling or regulating in general G05
• CPC Class Codes: H01L 21/67265 of substrates stored in a container, a magazine, a carrier, a boat or the like

Abstract

An apparatus used for an epitaxial vapor growing arrangement and for detecting whether a wafer is properly seated within a susceptor contained therein. The apparatus includes a semiconductor laser element that generates a laser beam which irradiates the wafer'"'"'s surface. The apparatus, further, includes a combination of a stop mechanism, a condenser lens and a photo diode, which detects the laser beam reflected from the wafer surface and an operation circuit, which determines the wafer'"'"'s posture on the susceptor. During operation, the reflected laser beam focuses on a receiving surface of the photo diode through the condenser lens. The operation circuit then compares the output signal from the photo diode with a preset reference value for discriminating the slope of the wafer.

Claims

1. An apparatus comprising:

a wafer positioned on a susceptor including a step;

a light beam source for irradiating a light beam to a surface of said wafer;

an electric signal mechanism for producing an electric signal with respect to said light beam reflected onto said wafer'"'"'s surface; and

a detection mechanism for detecting whether said wafer is correctly positioned within said step of said susceptor based upon said electrical signal.

2. The apparatus as according to claim 1, wherein said light beam source is a laser beam.

3. The apparatus as according to claim 1 or 2 wherein said electrical signal mechanism is a photo-sensitive element installed within said apparatus so as to receive the reflected light beam quantity in accordance with a slope of said wafer'"'"'s surface.

4. The apparatus as according to claim 1 or 2 wherein said electrical signal mechanism is a plurality of photo sensitive elements arranged in a plane perpendicular to an optical axis of the light beam so as to detect a position of the plane to which the reflected light beam reaches.

5. The apparatus as according to claim 3, wherein said electrical signal mechanism further contains an adjustable aperture installed in front of said photo-sensitive element.

6. The apparatus as according to claim 4, wherein said electrical signal mechanism further contains an adjustable aperture installed in front of said photo-sensitive element.

7. The apparatus as according to claim 3, wherein said electrical signal mechanism further contains a condenser lens in front of said photo sensitive element.