Gas barrier film

• US 20030044552A1
• Filed: 06/06/2002
• Published: 03/06/2003
• Est. Priority Date: 06/08/2001
• Status: Active Grant

• Current Assignee: Dai Nippon Printing Company Limited
• Original Assignee: Dai Nippon Printing Company Limited
• Inventors: Komada, Minoru
• Granted Patent: US 6,905,769 B2
• Time in Patent Office: Days
• US Class Current: 428/35.7
• CPC Class Codes: B32B 27/08 of synthetic resin
• CPC Class Codes: C09K 2323/05 Bonding or intermediate layer characterised by chemical composition, e.g. sealant or spacer
• CPC Class Codes: C09K 2323/051 Inorganic, e.g. glass or silicon oxide
• CPC Class Codes: C09K 2323/053 Organic silicon compound, e.g. organosilicon
• CPC Class Codes: Y10T 428/1352 Polymer or resin containing [i.e., natural or synthetic]
• CPC Class Codes: Y10T 428/3154 Of fluorinated addition polymer from unsaturated monomers
• CPC Class Codes: Y10T 428/31663 As siloxane, silicone or silane

Abstract

It is an object of the present invention to provide a gas barrier film improved in gas barrier characteristics by decreasing the adsorbent of the surface of a gas barrier layer to water and the like. The present invention attains the above object by providing a gas barrier film comprising a substrate, a gas barrier layer which is a vacuum deposition film, formed on one surface or both surfaces of the above substrate, and a water-repellent layer which is a film having water repellency, formed on the above gas barrier layer.

Claims

1. A gas barrier film comprising a substrate, a gas barrier layer which is a vacuum deposition film, formed on one surface or both surfaces of the substrate, and a water-repellent layer which is a film having water repellency, formed on the gas barrier layer.

2. A gas barrier film according to claim 1, wherein the gas barrier film further comprises a water-repellent layer which is a film having water repellency, formed between the substrate and the gas barrier layer.

3. A gas barrier film according to claim 1, wherein the contact angle with water on the surf ace of the water-repellent layer is 60°

or more (measuring temperature;

23°

C.).

4. A gas barrier film according to claim 1, wherein the water-repellent layer is a layer formed by a vacuum deposition method.

5. A gas barrier film according to claim 4, wherein the water-repellent layer is an organic film comprising a metal skeleton and having a methyl group, an organic film constituted of only carbon and hydrogen (C and H) or a film containing fluorine (F).

6. A gas barrier film according to claim 5, wherein the organic film comprising a metal skeleton and having a methyl group is an organic silicon type material represented by Si_x(CH₃)_y or (SiO)_x(CH₃)_y or its polymer film.

7. A gas barrier film according to claim 5, wherein the film containing fluorine (F) is an organic silicon fluoride material represented by Si_xC_yF_z or its polymer film, a silicon fluoride material represented by Si_xF_y or its polymer film, or a fluorine-containing hydrocarbon type material represented by C_xF_y or its polymer film.

8. A gas barrier film according to claim 4, wherein the film thickness of the water-repellent layer is in a range from 1 nm to 1000 nm.

9. A gas barrier film according to claim 1, wherein the water-repellent layer is a layer obtained by melting a thermoplastic resin having water repellency and by applying the melted resin.

10. A gas barrier film according to claim 1, wherein the water-repellent layer is a layer obtained by applying a water-repellent layer-forming coating solution prepared by dissolving or suspending a water-repellent layer-forming material having water repellency in a solvent.

11. A gas barrier film according to claim 1, wherein the gas barrier layer is a transparent layer comprising an inorganic oxide.

12. A gas barrier film according to claim 11, wherein the gas barrier layer is a silicon oxide film formed by a CVD deposition method.

13. A gas barrier film according to claim 12, wherein the silicon oxide film has an element compositional ratio of 170 to 200 O atoms and 30 or less C atoms to 100 Si atoms and also has IR absorption based on Si—

O—

Si stretching vibration between 1055 cm<sup>−

1</sup> and 1065 cm<sup>−

1</sup>.

14. A gas barrier film according to claim 13, wherein the silicon oxide film has a refractive index of 1.45 to 1.48.

15. A gas barrier film according to claim 12, wherein the silicon oxide film has a thickness of 5 to 300 nm.

16. A gas barrier film according to claim 1, wherein the gas barrier layer and water-repellent layer are laminated plurally.

17. A gas barrier film according to claim 16, wherein the water-repellent layer and gas barrier layer are laminated in this order to form paired five layers.

18. A gas barrier film according to claim 1, wherein the gas barrier film has an oxygen transmission rate of 0.5 cc/m²/day·

atm or less and a water vapor transmission rate of 0.5 g/m²/day or less.

19. A laminate material comprising a heat sealing resin layer disposed on at least one surface of the gas barrier film as claimed in claim 1.

20. A packaging container produced by using the laminate material as claimed in claim 19 and by thermally fusing the heat sealing resin layer to carry out bag-making or box-making.

21. A laminate material comprising a conductive layer formed on at least one surface of the gas barrier film as claimed in claim 1.

22. An image display medium produced by using the laminate material as claimed in claim 21 as a base material and by forming an image display layer on the conductive layer.