THIN FILM TRANSISTOR AND MATRIX DISPLAY DEVICE

• US 20030047785A1
• Filed: 08/21/2002
• Published: 03/13/2003
• Est. Priority Date: 09/10/2001
• Status: Active Grant

• Current Assignee: Hideo Ohno, Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.), Masashi Kawasaki
• Original Assignee: Masahi Kawasaki
• Inventors: Kawasaki, Masashi, Ohno, Hideo, Kobayashi, Kazuki, Sakono, Ikuo
• Granted Patent: US 6,563,174 B2
• Time in Patent Office: Days
• US Class Current: 257/350
• CPC Class Codes: H01L 27/1214 comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
• CPC Class Codes: H01L 27/1225 with semiconductor materials not belonging to the group IV of the periodic table, e.g. InGaZnO
• CPC Class Codes: H01L 29/4908 for thin film semiconductor, e.g. gate of TFT
• CPC Class Codes: H01L 29/66969 of devices having semiconductor bodies not comprising group 14 or group 13/15 materials comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials, comprising cuprous oxide or cuprous iodide H01L21/02365
• CPC Class Codes: H01L 29/78603 characterised by the insulating substrate or support H01L29/78657 takes precedence
• CPC Class Codes: H01L 29/7869 having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate

Abstract

In a thin film transistor, a gate insulating film having a first insulating film and a second insulating film is formed on a gate electrode, and a semiconductor layer including ZnO etc. is formed on the second insulating film. The first insulating film is formed by using SiN_x having a high insulating characteristic, and the second insulating film is formed by using an oxide (for example, SiO₂). This structure improves a crystalline characteristic of the semiconductor layer that constitutes an interface in combination with the second insulating film, and decreases a defective level of the interface between the semiconductor layer and the second insulating film. Further, the second insulating film is constituted of the oxide, so that it is possible to restrain a material for the second insulating film from depriving oxygen of the semiconductor layer. This keeps a crystalline characteristic of the semiconductor layer under a preferable condition in the vicinity of the interface between the second insulating film and the semiconductor layer. As a result, it is possible to realize a thin film transistor such that: a leak current level at an OFF area is low, and the mobility is high, and a switching characteristic is preferable. Thus, in the thin film transistor having a transparent semiconductor film, a TFT characteristic is improved.

Claims

1. A thin film transistor comprising:

a semiconductor layer made of ZnO, Mg_xZn_1-xO, Cd_xZn_1-xO or CdO or ZnO, Mg_xZn_1-xO, Cd_xZn_1-xO or CdO that have been doped with (a) an element that can be univalent or (b) Ni; and

a gate insulating film, wherein

the gate insulating film includes;

a first insulating film made of a material other than an oxide for constituting an interface in combination with a gate electrode; and

a second insulating film, sandwiched between the first insulating film and the semiconductor layer, that is made of an oxide for constituting interfaces in combination with both the first insulating film and the semiconductor layer.

2. The thin film transistor as set forth in claim 1, further comprising a base layer having the semiconductor layer thereon, wherein the base layer is made of KNbO₃, KTaO₃, BaTiO₃, CaSnO₃, CaZrO₃, CdSnO₃, SrHfO₃, SrSnO₃, SrTiO₃, YScO₃, CaHfO₃, MgCeO₃, SrCeO₃, BaCeO₃, SrZrO₃, BaZrO₃, LiGaO₂, mixed crystal (Li_1-(x+y)Na_xK_y)(Ga_1-zAl_z)O₂ of LiGaO₂, or a solid solution having at least two of these oxides, so as to constitute the thin film transistor in a staggered manner.

3. The thin film transistor as set forth in claim 1, wherein the first insulating film is made of SiN_x.

4. The thin film transistor as set forth in claim 3, further comprising a base layer having the semiconductor layer thereon, wherein the base layer is made of KNbO₃, KTaO₃, BaTiO₃, CaSnO₃, CaZrO₃, CdSnO₃, SrHfO₃, SrSnO₃, SrTiO₃, YScO₃, CaHfO₃, MgCeO₃, SrCeO₃, BaCeO₃, SrZrO₃, BaZrO₃, LiGaO₂, mixed crystal (Li_1-(x+y)Na_xK_y)(Ga_1-zAl_z)O₂ of LiGaO₂, or a solid solution having at least two of these oxides, so as to constitute the thin film transistor in a staggered manner.

5. The thin film transistor as set forth in claim 1, wherein the second insulating film is made of SiO₂, Ta₂O₅, Al₂O₃, TiO₂, MgO, ZrO₂, stab-ZrO₂, CeO₂, K₂O, Li₂, O, Na₂O, Rb₂O, In₂O₃, La₂O₃, Sc₂O₃, Y₂O₃, or a solid solution having at least two of these oxides.

6. The thin film transistor as set forth in claim 5, wherein the first insulating film is made of SiN_x.

7. The thin film transistor as set forth in claim 5, further comprising a base layer having the semiconductor layer thereon, wherein the base layer is made of KNbO₃, KTaO₃, BaTiO₃, CaSnO₃, CaZrO₃, CdSnO₃, SrHfO₃, SrSnO₃, SrTiO₃, YScO₃, CaHfO₃, MgCeO₃, SrCeO₃, BaCeO₃, SrZrO₃, BaZrO₃, LiGaO₂, mixed crystal (Li_1-(x+y)Na_xK_y)(Ga_1-zAl_z)O₂ of LiGaO₂, or a solid solution having at least two of these oxides, so as to constitute the thin film transistor in a staggered manner.

8. A thin film transistor comprising:

a semiconductor layer made of ZnO, Mg_xZn_1-xO, Cd_xZn_1-xO or CdO or ZnO, Mg_xZn_1-xO, Cd_xZn_1-xO or CdO that have been doped with (a) an element that can be univalent or (b) Ni; and

a gate insulating film, wherein

the gate insulating film includes;

a first insulating film made of a material other than an oxide for constituting an interface in combination with a gate electrode; and

a second insulating film, sandwiched between the first insulating film and the semiconductor layer, that has an oxide for constituting interfaces in combination with both the first insulating film and the semiconductor layer, the second insulating film being made of KNbO₃, KTaO₃, BaTiO₃, CaSO₃, CaZrO₃, CdSnO₃, SrHfO₃, SrSnO₃, SrTiO₃, YScO₃, CaHfO₃, MgCeO₃, SrCeO₃, BaCeO₃, SrZrO₃, BaZrO₃, LiGaO₂, mixed crystal (Li_1-(x+y)Na_xK_y)(Ga_1-zAl_z)O₂ of LiGaO₂, or a solid solution having at least two of these oxides.

9. The thin film transistor as set forth in claim 8, further comprising a base layer having the semiconductor layer thereon, wherein the base layer is made of KNbO₃, KTaO₃, BaTiO₃, CaSnO₃, CaZrO₃, CdSnO₃, SrHfO₃, SrSnO₃, SrTiO₃, YScO₃, CaHfO₃, MgCeO₃, SrCeO₃, BaCeO₃, SrZrO₃, BaZrO₃, LiGaO₂, mixed crystal (Li_1-(x+y)Na_xK_y)(Ga_1-zAl_z)O₂ of LiGaO₂, or a solid solution having at least two of these oxides, so as to constitute the thin film transistor in a staggered manner.

10. The thin film transistor as set forth in claim 8, wherein the first insulating film is made of SiN_x.

11. The thin film transistor as set forth in claim 10, further comprising a base layer having the semiconductor layer thereon, wherein the base layer is made of KNbO₃, KTaO₃, BaTiO₃, CaSnO₃, CaZrO₃, CdSnO₃, SrHfO₃, SrSnO₃, SrTiO₃, YScO₃, CaHfO₃, MgCeO₃, SrCeO₃, BaCeO₃, SrZrO₃, BaZrO₃, LiGaO₂, mixed crystal (Li_1-(x+y)Na_xK_y)(Ga_1-zAl_z)O₂ of LiGaO₂, or a solid solution having at least two of these oxides, so as to constitute the thin film transistor in a staggered manner.

12. A matrix display device comprising switching elements disposed in a matrix manner, wherein each of the switching elements is constituted of a thin film transistor that includes:

a semiconductor layer made of ZnO, Mg_xZn_1-xO, Cd_xZn_1-xO or CdO or ZnO, Mg_xZn_1-xO, Cd_xZn_1-xO or CdO that have been doped with (a) an element that can be univalent or (b) Ni; and

a gate insulating film, wherein the gate insulating film has;

a first insulating film made of a material other than an oxide for constituting an interface in combination with a gate electrode; and

a second insulating film, sandwiched between the first insulating film and the semiconductor layer, that is made of an oxide for constituting interfaces in combination with both the first insulating film and the semiconductor layer.

13. The matrix display device as set forth in claim 12, further comprising a driving circuit for driving the switching element, wherein the thin film transistor is also used as a transistor that constitutes the driving circuit, and the switching element and the transistor are simultaneously provided.

14. The matrix display device as set forth in claim 12, wherein the thin film transistor further includes a base layer having the semiconductor layer thereon, wherein the base layer is made of KNbO₃, KTaO₃, BaTiO₃, CaSnO₃, CaZrO₃, CdSnO₃, SrHfO₃, SrSnO₃, SrTiO₃, YScO₃, CaHfO₃, MgCeO₃, SrCeO₃, BaCeO₃, SrZrO₃, BaZrO₃, LiGaO₂, mixed crystal (Li_1-(x+y)Na_xK_y)(Ga_1-zAl_z)O₂ of LiGaO₂, or a solid solution having at least two of these oxides, so as to constitute the thin film transistor in a staggered manner.

15. The matrix display device as set forth in claim 12, wherein the first insulating film of the thin film transistor is made of SiN_x.

16. The matrix display device as set forth in claim 15, wherein the thin film transistor further includes a base layer having the semiconductor layer thereon, wherein the base layer is made of KNbO₃, KTaO₃, BaTiO₃, CaSnO₃, CaZrO₃, CdSnO₃, SrHfO₃, SrSnO₃, SrTiO₃, YScO₃, CaHfO₃, MgCeO₃, SrCeO₃, BaCeO₃, SrZrO₃, BaZrO₃, LiGaO₂, mixed crystal (Li_1-(x+y)Na_xK_y)(Ga_1-zAl_z)O₂ of LiGaO₂, or a solid solution having at least two of these oxides, so as to constitute the thin film transistor in a staggered manner.

17. The matrix display device as set forth in claim 12, wherein the second insulating film of the thin film transistor is made of SiO₂, Ta₂O₅, Al₂O₃, TiO₂, MgO, ZrO₂, stab-ZrO₂, CeO₂, K₂O, Li₂, O, Na₂O, Rb₂O, In₂O₃, La₂O₃, Sc₂O₃, Y₂O₃, or a solid solution having at least two of these oxides.

18. The matrix display device as set forth in claim 17, wherein the first insulating film of the thin film transistor is made of SiN_x.

19. The matrix display device as set forth in claim 18, wherein the thin film transistor further includes a base layer having the semiconductor layer thereon, wherein the base layer is made of KNbO₃, KTaO₃, BaTiO₃, CaSnO₃, CaZrO₃, CdSnO₃, SrHfO₃, SrSnO₃, SrTiO₃, YScO₃, CaHfO₃, MgCeO₃, SrCeO₃, BaCeO₃, SrZrO₃, BaZrO₃, LiGaO₂, mixed crystal (Li_1-(x+y)Na_xK_y)(Ga_1-zAl_z)O₂ of LiGaO₂, or a solid solution having at least two of these oxides, so as to constitute the thin film transistor in a staggered manner.

20. A matrix display device comprising switching elements disposed in a matrix manner, wherein

each of the switching elements is constituted of a thin film transistor that includes:

a semiconductor layer made of ZnO, Mg_xZn_1-xO, Cd_xZn_1-xO or CdO or ZnO, Mg_xZn_1-xO, Cd_xZn_1-xO or CdO that have been doped with (a) an element that can be univalent or (b) Ni; and

a gate insulating film, wherein the gate insulating film has;

a first insulating film made of a material other than an oxide for constituting an interface in combination with a gate electrode; and

a second insulating film, sandwiched between the first insulating film and the semiconductor layer, that constitutes interfaces in combination with both the first insulating film and the semiconductor layer, the second insulating film being made of KNbO₃, KTaO₃, BaTiO₃, CaSnO₃, CaZrO₃, CdSnO₃, SrHfO₃, SrSnO₃, SrTiO₃, YScO₃, CaHfO₃, MgCeO₃, SrCeO₃, BaCeO₃, SrZrO₃, BaZrO₃, LiGaO₂, mixed crystal (Li_1-(x+y)Na_xK_y)(Ga_1-zAl_z)O₂ of LiGaO₂, or a solid solution having at least two of these oxides.

21. The matrix display device as set forth in claim 20, further comprising a driving circuit for driving the switching element, wherein the thin film transistor is also used as a transistor that constitutes the driving circuit, and the switching element and the transistor are simultaneously provided.

22. The matrix display device as set forth in claim 20, wherein the thin film transistor further includes a base layer having the semiconductor layer thereon, wherein the base layer is made of KNbO₃, KTaO₃, BaTiO₃, CaSnO₃, CaZrO₃, CdSnO₃, SrHfO₃, SrSnO₃, SrTiO₃, YScO₃, CaHfO₃, MgCeO₃, SrCeO₃, BaCeO₃, SrZrO₃, BaZrO₃, LiGaO₂, mixed crystal (Li_1-(x+y)Na_xK_y)(Ga_1-zAl_z)O₂ of LiGaO₂, or a solid solution having at least two of these oxides, so as to constitute the thin film transistor in a staggered manner.

23. The matrix display device as set forth in claim 20, wherein the first insulating film of the thin film transistor is made of SiN_x.

24. The matrix display device as set forth in claim 23, wherein the thin film transistor further includes a base layer having the semiconductor layer thereon, wherein the base layer is made of KNbO₃, KTaO₃, BaTiO₃, CaSnO₃, CaZrO₃, CdSnO₃, SrHfO₃, SrSnO₃, SrTiO₃, YScO₃, CaHfO₃, MgCeO₃, SrCeO₃, BaCeO₃, SrZrO₃, BaZrO₃, LiGaO₂, mixed crystal (Li_1-(x+y)Na_xK_y)(Ga_1-zAl_z)O₂ of LiGaO₂, or a solid solution having at least two of these oxides, so as to constitute the thin film transistor in a staggered manner.