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Method of and apparatus for inspection of articles by comparison with a master

  • US 20030048939A1
  • Filed: 10/31/2002
  • Published: 03/13/2003
  • Est. Priority Date: 05/18/1999
  • Status: Abandoned Application
First Claim
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1. A method of inspecting articles related to semiconductor manufacture comprising:

  • a) creating a defect free master image by losslessly imaging a defect free article and storing such defect-free master image;

    b) imaging the article under inspection;

    c) comparing the image of article under inspection with the defect-free master image;

    d) outputting the results of the image comparison, specifically identifying locations of image deviations.

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