Interferometric stage system

• US 20030053074A1
• Filed: 08/26/2002
• Published: 03/20/2003
• Est. Priority Date: 08/28/2001
• Status: Active Grant

• Current Assignee: Zygo Corporation (Ametek Incorporated)
• Original Assignee: Zygo Corporation (Ametek Incorporated)
• Inventors: Hill, Henry A.
• Granted Patent: US 6,912,054 B2
• Time in Patent Office: Days
• US Class Current: 356/500
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position
• CPC Class Codes: H01J 2237/20292 Means for position and/or orientation registration
• CPC Class Codes: H01J 2237/3175 Lithography
• CPC Class Codes: H01J 37/3174 Particle-beam lithography, e.g. electron beam lithography

Abstract

an apparatus including: a support structure; a stage configured to move relative to the support structure; a first reflection surface carried by one of the support structure and the stage; and a first interferometry system. The first interferometry system is configured to direct a first measurement beam to contact the first reflection surface and monitor changes in the position and orientation of the stage relative to the support structure along multiple degrees of freedom using the first measurement beam and no other measurement beam that contacts the first reflection surface. For example, the first measurement beam can define a first measurement axis and the multiple degrees of freedom can include at least two of: distance along the first measurement axis, pitch about the first measurement axis, and yaw about the first measurement axis.

Claims

1. Apparatus comprising:

a support structure;

a stage configured to move relative to the support structure;

a first reflection surface carried by one of the support structure and the stage; and

a first interferometry system configured to direct a first measurement beam to contact the first reflection surface and monitor changes in the position and orientation of the stage relative to the support structure along multiple degrees of freedom using the first measurement beam and no other measurement beam that contacts the first reflection surface.

2. The apparatus of claim 1, wherein the first measurement beam defines a first measurement axis and wherein the multiple degrees of freedom comprise at least two of distance along the first measurement axis, pitch about the first measurement axis, and yaw about the first measurement axis.

3. The apparatus of claim 1, wherein the first interferometry system comprises a single measurement beam interferometer (SMBI) which during operation maintains the first measurement beam normal to the first reflection surface over a range of angular orientations of the stage relative to the support structure.

4. The apparatus of claim 3, wherein the SBMI in the first interferometry system directs the first measurement beam to contact the first reflection surface only once.

5. The apparatus of claim 3, wherein the SBMI in the first interferometry system directs the first measurement beam to contact the first reflection surface multiple times.

6. The apparatus of claim 1, wherein the first interferometry system combines at least portion of the first measurement beam reflected from the first reflection surface with a reference beam to produce an interferometric signal indicative of a change in optical path length.

7. The apparatus of claim 3, wherein the SMBI in the first interferometry system determines an angular orientation of the stage relative to the support structure based information related to the direction of the measurement beam.

8. The apparatus of claim 7, wherein the SMBI comprises an angle measuring interferometer to interferometrically monitor the direction of the measurement beam.

9. The apparatus of claim 3, wherein the SMBI is a passive SMBI which is configured to direct an input beam to reflect at least once from the first reflection surface and then separate the input beam into the first measurement beam and at least one other beam.

10. The apparatus of claim 9, wherein the passive SMBI comprises a beam conditioning portion for directing the input beam to reflect from the first reflection surface and an afocal magnification or demagnification system to scale the change in propagation direction imparted to the input beam after it reflects from the first reflection surface.

11. The apparatus of claim 3, wherein the SMBI is a dynamic SMBI which comprises a dynamic beam steering element that is servo-ed to the orientation of the first reflection surface to maintain the first measurement beam normal to the first reflection surface over the range of angular orientations of the stage relative to the support structure.

12. The apparatus of claim 11, wherein the dynamic beam steering element is positioned to direct and contact the first measurement beam.

13. The apparatus of claim 11, wherein the dynamic beam steering element is positioned to direct and contact a progenitor beam to the first measurement beam.

14. The apparatus of claim 11, wherein the dynamic beam steering element is responsive to a servo signal derived from a measurement of the propagation directions of the first measurement beam or a beam derived from the first measurement beam after it has reflected from the first reflection surface.

15. The apparatus of claim 1, further comprising a drive system for moving the stage relative to the support structure.

16. The apparatus of claim 1, wherein the first interferometry system is secured to the support structure and the first reflection surface is carried by the stage.

17. The apparatus of claim 1, wherein the first interferometry system is secured to the stage and the first reflection surface is carried by the support structure.

18. The apparatus of claim 1, further comprising a mirror having the first reflection surface, the mirror being secured to the one of the stage and the support structure.

19. The apparatus of claim 1, wherein the first reflection surface is formed by a reflecting edge surface of the stage.

20. The apparatus of claim 1, wherein the first reflection surface is formed by a reflecting edge surface of the support structure.

21. The apparatus of claim 1, wherein the first interferometry system comprises a photodetector for measuring an interferometric optical signal.

22. The apparatus of claim 1, wherein the first interferometry system comprises a fiber optic pick-up for coupling an interferometric optical signal to a remote photodetector.

23. The apparatus of claim 1, wherein the stage is configured to support a semiconductor wafer.

24. The apparatus of claim 1, wherein the stage is configured to support a mask.

25. The apparatus of claim 1, further comprising an illumination source for directing radiation onto an object supported by the stage.

26. The apparatus of claim 1, further comprising

a second reflection surface carried by one of the support structure and the stage, the second reflection surface having an orientation different than that of the first reflection surface, and

a second interferometry system configured to direct a second measurement beam to contact the second reflection surface and monitor changes in the position and orientation of the stage relative to the support structure along multiple degrees of freedom using the second measurement beam and no other measurement beam that contacts the second reflection surface.

27. The apparatus of claim 26, further comprising a light source providing an input beam to each of the interferometry systems.

28. The apparatus of claim 26, wherein the first and second reflection surfaces are each positioned on different sides of the stage.

29. The apparatus of claim 28, wherein the first and second interferometry systems are each secured to the support structure.

30. The apparatus of claim 26, wherein the first and second reflection surfaces are each carried by the support structure and have substantially orthogonal orientations.

31. The apparatus of claim 30, wherein the first and second interferometry systems are each secured to the stage.

32. The apparatus of claim 26, wherein the first and second interferometry systems monitor changes in the position of the stage relative to the support structure along five degrees of freedom.

33. The apparatus of claim 32, wherein the five degrees of freedom are distance along each of two orthogonal axes, orientation about each of the two orthogonal axes, and an orientation about a third axis that is orthogonal to each of the first two orthogonal axes.

34. The apparatus of claim 26, further comprising a third interferometry system for monitoring translations of the stage along an azimuthal direction.

35. The apparatus of claim 26, wherein the first and second interferometry systems share common optics.

36. Apparatus comprising:

an object stage for carrying an object, the stage lying predominantly in the x-y plane of a Cartesian coordinate system;

a drive for moving the object stage in at least the x-direction, the y-direction, and a rotation about the z-axis; and

an interferometry system configured to monitor changes in the position of the stage along each of the x- and y-axes and changes in orientation about each of the x-, y-, and z-axes using fewer than five measurement axes.

37. The apparatus of claim 36, wherein the interferometry system comprises interferometer mirrors positioned relative to two edges of the stage.

38. The apparatus of claim 37, wherein the interferometer mirrors are reflecting edge surfaces of the stage.

39. The apparatus of claim 37, wherein the interferometer mirrors are stick mirrors attached to the stage.

40. The apparatus of claim 36, wherein the interferometry system comprises interferometer mirrors formed on a reference support structure.

41. The apparatus of claim 40, wherein the interferometry system is carried by the stage.

42. The apparatus of claim 40, wherein the interferometry system is secured to a second reference support structure.

43. The apparatus of claim 40, further comprising an interferometer configured to monitor the z-position of the stage.