Method and device for depositing at least one precursor, which is in liquid or dissolved form, on at least one substrate
First Claim
1. A device for depositing at least one precursor, which is in liquid or dissolved form, on at least one substrate, having at least one reservoir (6) for the precursor(s) (6′
- ), which is/are in individual or mixed form, a reactor chamber (1), in which the substrate(s), to which at least one film is to be applied, are disposed, a delivery device (8), which delivers the precursor(s) (6′
) via at least one line (7) from the reservoir(s) (6) to at least one region (4) in which the precursor(s) (6′
) are to be evaporated, and a control unit which controls the delivery device (8), characterized in that there is a sensor unit (41, 42), which records the quantity of precursors supplied per unit time and the output signal from which is applied to the control unit as an actual signal, and in that the control unit regulates the delivery device (8) in such a manner that the mass flow of precursors, taken as a mean over a defined period of time, has a predetermined value.
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Accused Products
Abstract
Disclosed is device for depositing at least one precursor, on at least one substrate, said precursor being present in the liquid or dissolved form. The inventive device comprises at least one storage container for the individual or mixed precursor/s and a reaction chamber in which the substrate/s is/are arranged, the layers being placed on said substrates. The inventive device also comprises a conveying device that conveys the precursor/s from the storage container/s to the area by means of at least one line, whereby the precursor/s are vaporized in said area. Said device further comprises a control unit which controls the conveying device. The invention is characterized in that a sensor unit is provided which detects the amount of the supplied precursors and has an output signal that is applied to the control unit as a real signal. The control unit controls the conveying device in such a way that the mass flow pertaining to the precursors has a mean predetermined value during a given time period.
34 Citations
35 Claims
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1. A device for depositing at least one precursor, which is in liquid or dissolved form, on at least one substrate, having
at least one reservoir (6) for the precursor(s) (6′ - ), which is/are in individual or mixed form,
a reactor chamber (1), in which the substrate(s), to which at least one film is to be applied, are disposed, a delivery device (8), which delivers the precursor(s) (6′
) via at least one line (7) from the reservoir(s) (6) to at least one region (4) in which the precursor(s) (6′
) are to be evaporated, anda control unit which controls the delivery device (8), characterized in that there is a sensor unit (41, 42), which records the quantity of precursors supplied per unit time and the output signal from which is applied to the control unit as an actual signal, and in that the control unit regulates the delivery device (8) in such a manner that the mass flow of precursors, taken as a mean over a defined period of time, has a predetermined value. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33)
- ), which is/are in individual or mixed form,
- 34. A process for depositing at least one precursor, which is in liquid or dissolved form, on at least one substrate, in which the precursors, which are in individual or mixed form, are delivered by a delivery device via at least one line into at least one evaporation region, so that they form the films on the substrate arranged in a reactor chamber, characterized in that the quantity of precursors supplied is recorded, and in that the mass flow of the precursors, taken as a mean over a certain period of time, is set to a predetermined value.
Specification