×

High throughput chemical analysis by improved desorption/ionization on silicon mass spectrometry

  • US 20030057106A1
  • Filed: 09/12/2002
  • Published: 03/27/2003
  • Est. Priority Date: 09/12/2001
  • Status: Abandoned Application
First Claim
Patent Images

1. A method of making improved substrates for desorbing and ionizing analytes comprising:

  • providing an n-type semiconductor substrate;

    providing a light source;

    focusing the illumination from the light source onto the n-type semiconductor substrate to result in at least one lit region on the n-type semiconductor substrate; and

    electrochemically etching the n-type semiconductor substrate with a low current during illumination to form at least one sample reservoir on the substrate, each sample reservoir being formed at a respective lit region on the n-type semiconductor substrate.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×