Method for controlling a processing apparatus
First Claim
1. In a method for controlling a processing apparatus comprising the steps of:
- obtaining an error value between an input value of the processing apparatus for processing an subject to be processed and a measurement value obtained by measuring the subject processed in the processing apparatus, computing a correction value for correcting the input value of the processing apparatus in the direction of decreasing the error value, and managing the values as processing data to be utilized in computing a next correction value, said method further comprising the steps of;
searching previous processing data having a history identical to that of the subject loaded into the processing apparatus;
predicting a current bias correction value from a plurality of most recent previous correction values out of the searched previous processing data having the identical history;
predicting a current random correction value by means of a neural network on a basis of a plurality of most recent previous random correction values out of the previous processing data;
summing the predicted current bias correction value and the predicted current random correction value as a current correction value of the processing apparatus; and
making the neural network learn for tracking a variation of the random correction value by using the error value.
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Abstract
In a method for controlling a processing apparatus, an error value between an input value of the processing apparatus for processing a subject to be processed, and a measurement value obtained by measuring the subject being processed is obtained. A correction value is computed for correcting the input value of the processing apparatus in the direction of decreasing the error value, and the values are managed as processing data to be utilized in computing a next correction value. Previous processing data having a history identical to that of the subject loaded to the processing apparatus is searched, and a current bias correction value is predicted from a plurality of most recent correction values having the identical history. Also, a current random correction value is predicted by means of a neural network on the basis of a plurality of most recent random correction values. The predicted bias correction value is summed with the random correction value as a current correction value of the processing apparatus.
16 Citations
18 Claims
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1. In a method for controlling a processing apparatus comprising the steps of:
- obtaining an error value between an input value of the processing apparatus for processing an subject to be processed and a measurement value obtained by measuring the subject processed in the processing apparatus, computing a correction value for correcting the input value of the processing apparatus in the direction of decreasing the error value, and managing the values as processing data to be utilized in computing a next correction value, said method further comprising the steps of;
searching previous processing data having a history identical to that of the subject loaded into the processing apparatus;
predicting a current bias correction value from a plurality of most recent previous correction values out of the searched previous processing data having the identical history;
predicting a current random correction value by means of a neural network on a basis of a plurality of most recent previous random correction values out of the previous processing data;
summing the predicted current bias correction value and the predicted current random correction value as a current correction value of the processing apparatus; and
making the neural network learn for tracking a variation of the random correction value by using the error value. - View Dependent Claims (2, 3, 4)
- obtaining an error value between an input value of the processing apparatus for processing an subject to be processed and a measurement value obtained by measuring the subject processed in the processing apparatus, computing a correction value for correcting the input value of the processing apparatus in the direction of decreasing the error value, and managing the values as processing data to be utilized in computing a next correction value, said method further comprising the steps of;
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5. In a method for controlling a photolithography apparatus comprising the steps of:
- obtaining an error value between an input value of the photolithography apparatus for processing a photoresist over a wafer and a measurement value obtained by measuring a photoresist pattern subjected to an exposure and a development in the processing apparatus by means of an overlay measurement instrument;
computing a correction value for correcting the input value in a direction of decreasing the error value; and
managing photolithographic processing data in the production time unit for utilizing the values in computing a next correction value,said method further comprising the steps of;
searching previous processing data having a history identical to that of a new lot loaded into the photolithography apparatus;
predicting a bias component of a current correction value from a plurality of most recent previous correction values out of the searched previous processing data having the searched identical history;
predicting a random component of the current correction value by means of a neural network on a basis of a plurality of most recent previous random correction values out of the previous processing data;
summing the predicted bias component and random component as a current correction value of the photolithography apparatus; and
making the neural network learn for tracking the variation of the random component by using the error value. - View Dependent Claims (6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
- obtaining an error value between an input value of the photolithography apparatus for processing a photoresist over a wafer and a measurement value obtained by measuring a photoresist pattern subjected to an exposure and a development in the processing apparatus by means of an overlay measurement instrument;
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17. In a method for controlling a photolithography apparatus comprising the steps of:
- obtaining an error value between an input value of the photolithography apparatus for performing a photolithography upon a photoresist over a wafer and a measurement value obtained by measuring a photoresist pattern subjected to an exposure and a development in the photolithography apparatus via an overlay measurement instrument;
computing a correction value for correcting the input value in a direction of decreasing the error value; and
managing photolithographic processing data in the production time unit for utilizing the values in computing a next correction value,said method further comprising the steps of;
searching previous processing data having history constituting elements (Reticle, PPID, BASE I and BASE II) identical to those of a new lot loaded into the photolithography apparatus;
predicting a bias component of a current correction value from a plurality of most recent previous correction values out of the searched previous processing data having the identical history constituting elements;
extracting processing data with one different constituting element except the Reticle among the history constituting elements when no previous processing data having the identical history constituting elements exists;
guessing the bias component of the correction value by means of a relative value of a certain history constituting element out of the processing data with a single different history constituting element extracted;
obtaining a mean value of the processing data with the extracted single different history constituting element to be guessed as the bias component of the correction value when the bias component cannot be computed by using the relative value;
predicting a random component of the current correction value by means of a neural network on a basis of a plurality of most recent previous random correction values out of the previous processing data;
summing the predicted bias component and predicted random component as a current correction value of the photolithography apparatus; and
making the neural network learn for tracking a variation of the random correction value by using the error value. - View Dependent Claims (18)
- obtaining an error value between an input value of the photolithography apparatus for performing a photolithography upon a photoresist over a wafer and a measurement value obtained by measuring a photoresist pattern subjected to an exposure and a development in the photolithography apparatus via an overlay measurement instrument;
Specification