Negative resist process with simultaneous development and chemical consolidation of resist structures

• US 20030064327A1
• Filed: 07/01/2002
• Published: 04/03/2003
• Est. Priority Date: 06/29/2001
• Status: Active Grant

• Current Assignee: Polaris Innovations Limited (Wi-LAN Inc.)
• Original Assignee: Qimonda AG (Infineon Technologies AG)
• Inventors: Rottstegge, Jorg
• Granted Patent: US 6,998,215 B2
• Time in Patent Office: Days
• US Class Current: 430/325
• CPC Class Codes: G03F 7/0382 the macromolecular compound being present in a chemically amplified negative photoresist composition
• CPC Class Codes: G03F 7/0392 the macromolecular compound being present in a chemically amplified positive photoresist composition
• CPC Class Codes: G03F 7/322 Aqueous alkaline compositions

Abstract

A process for producing amplified negative resist structures includes, following exposure and contrasting of the resist in a developing step, simultaneously developing and amplifying the resist structure. This substantially simplifies the production of amplified resist structures. Amplifying agents used include bicyclic or polycyclic compounds containing at least one reactive group for attachment to the photoresist polymer.

Claims

1. A process for producing amplified negative resist structures, which comprises:

applying a chemically amplified resist to a substrate, the resist including;

a polymer having a polarity and containing an acid-labile group and a bound anchor group, the acid-labile group being eliminatable by acid and being able to liberate the anchor group to change the polarity of the polymer;

a photoacid generator; and

a first solvent;

removing the solvent to yield a photosensitive resist film;

exposing sections of the photosensitive resist film to generate an acid from the photoacid generator in the exposed sections of the resist film;

contrasting the exposed resist film by eliminating the acid-labile group of the polymer with the acid and liberating the anchor group in the exposed sections of the resist film to change the polarity of the polymer;

developing the exposed and contrasted resist film with a developer, the developer including;

a second solvent for dissolving the polymer containing acid-labile groups and not dissolving and not swelling the polymer containing the liberated anchor groups are liberated;

an amplifying agent having a reactive group for coordinating the anchor groups of the polymer, and a polycyclic aliphatic group; and

removing excess of the developer.

2. The process according to claim 1, wherein the polycyclic aliphatic group of the amplifying agent is bicyclic.

3. The process according to claim 1, wherein the developer includes a swelling promoter for swelling the polymer having liberated anchor groups.

4. The process according to claims 1, wherein the solvent of the developer is apolar.

5. The process according to claim 1, wherein the second solvent of the developer has a low polarity.

6. The process according to claim 1, wherein the polymer includes further reactive anchor groups for bonding with the reactive group of the amplifying agent.

7. The process according to claim 1, wherein the amplifying agent includes at least two reactive groups.

8. The process according to claim 1, wherein the reactive group of the amplifying agent is selected from the group consisting of a hydroxyl group, an amino group, a sulfonic acid group, a thiol group, a carboxyl group, a glycidyl ether, an anhydride group, an imide, an isocyanate group, a urethane, a ketene, and an epoxide.

9. The process according to claim 1, wherein the reactive group of the amplifying agent is basic.

10. The process according to claim 1, wherein the amplifying agent is selected from the group consisting of bis(aminomethyl)adamantane, bis(aminoethyl)adamantane, bis(aminopropyl)adamantane, norbornyldiamine, bis(aminomethyl)norbornane, bis(aminoethyl)norbornane, bis(aminopropyl)norbornane, bis(aminomethyl)bicyclo[2,2,2]octane, bis(aminoethyl)-bicyclo[2,2,2]octane, bis(aminopropyl)bicyclo[2,2,2]octane, bis(aminomethyl)tricyclo[5,2,1,0^2,6]decane, bis(aminoethyl)tricyclo[5,2,1,0^2,6]decane, and bis-(aminopropyl)tricyclo[5,2,1,0^2,6]decane.

11. The process according to claim 1, wherein the second solvent of the developer is selected from the group consisting of hexanol, isopropanol, heptane, and decane.