Negative resist process with simultaneous development and chemical consolidation of resist structures
First Claim
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1. A process for producing amplified negative resist structures, which comprises:
- applying a chemically amplified resist to a substrate, the resist including;
a polymer having a polarity and containing an acid-labile group and a bound anchor group, the acid-labile group being eliminatable by acid and being able to liberate the anchor group to change the polarity of the polymer;
a photoacid generator; and
a first solvent;
removing the solvent to yield a photosensitive resist film;
exposing sections of the photosensitive resist film to generate an acid from the photoacid generator in the exposed sections of the resist film;
contrasting the exposed resist film by eliminating the acid-labile group of the polymer with the acid and liberating the anchor group in the exposed sections of the resist film to change the polarity of the polymer;
developing the exposed and contrasted resist film with a developer, the developer including;
a second solvent for dissolving the polymer containing acid-labile groups and not dissolving and not swelling the polymer containing the liberated anchor groups are liberated;
an amplifying agent having a reactive group for coordinating the anchor groups of the polymer, and a polycyclic aliphatic group; and
removing excess of the developer.
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Abstract
A process for producing amplified negative resist structures includes, following exposure and contrasting of the resist in a developing step, simultaneously developing and amplifying the resist structure. This substantially simplifies the production of amplified resist structures. Amplifying agents used include bicyclic or polycyclic compounds containing at least one reactive group for attachment to the photoresist polymer.
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Citations
11 Claims
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1. A process for producing amplified negative resist structures, which comprises:
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applying a chemically amplified resist to a substrate, the resist including;
a polymer having a polarity and containing an acid-labile group and a bound anchor group, the acid-labile group being eliminatable by acid and being able to liberate the anchor group to change the polarity of the polymer;
a photoacid generator; and
a first solvent;
removing the solvent to yield a photosensitive resist film;
exposing sections of the photosensitive resist film to generate an acid from the photoacid generator in the exposed sections of the resist film;
contrasting the exposed resist film by eliminating the acid-labile group of the polymer with the acid and liberating the anchor group in the exposed sections of the resist film to change the polarity of the polymer;
developing the exposed and contrasted resist film with a developer, the developer including;
a second solvent for dissolving the polymer containing acid-labile groups and not dissolving and not swelling the polymer containing the liberated anchor groups are liberated;
an amplifying agent having a reactive group for coordinating the anchor groups of the polymer, and a polycyclic aliphatic group; and
removing excess of the developer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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Specification