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Plasma processing system and surface processing method

  • US 20030066487A1
  • Filed: 09/30/2002
  • Published: 04/10/2003
  • Est. Priority Date: 09/28/2001
  • Status: Active Grant
First Claim
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1. A plasma processing system in which gas is introduced into a plasma processing chamber, and a microwave is supplied to said plasma processing chamber through an annular waveguide having a plurality of slots provided at predetermined intervals in a circumferential direction on the same plane facing a surface to be processed of an object to be processed on the plasma processing chamber side to generate the plasma within said plasma processing chamber, wherein said annular waveguide includes an input side waveguide and an output side waveguide, and said slots are bored to be provided between said waveguides at predetermined intervals in a circumferential direction.

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