Substrate processing apparatus and a method for fabricating a semiconductor device by using same
First Claim
1. A substrate processing apparatus comprising:
- a process room for treating one or more substrates;
an antechamber of a loadlock type installed to be adjoined to the process room; and
a buffer chamber installed to be adjoined to the antechamber, the buffer chamber being maintained at an atmospheric pressure while the one or more substrates are transferred from a carrier for accommodating the one or more substrates to the buffer chamber and at a vacuum condition while the one or more substrates are transferred from the buffer chamber to the antechamber, wherein the buffer chamber is equipped with a loading port for loading the carrier at a top or a side portion thereof.
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Accused Products
Abstract
A substrate processing apparatus includes a process room for treating one or more substrates, an antechamber of a loadlock type installed to be adjoined to the process room, and a buffer chamber installed to be adjoined to the antechamber, the buffer chamber being maintained at an atmospheric pressure while the one or more substrates are transferred from a carrier for accommodating the one or more substrates to the buffer chamber and at a vacuum condition while the one or more substrates are transferred from the buffer chamber to the antechamber. The buffer chamber is equipped with a loading port for loading the carrier at a top or a side portion thereof. The antechamber is equipped with a stocker for storing one or more product substrates or/and one or more dummy substrates therein. The elevator is arranged at a corner portion of the antechamber in order to reduce dead space.
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Citations
5 Claims
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1. A substrate processing apparatus comprising:
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a process room for treating one or more substrates;
an antechamber of a loadlock type installed to be adjoined to the process room; and
a buffer chamber installed to be adjoined to the antechamber, the buffer chamber being maintained at an atmospheric pressure while the one or more substrates are transferred from a carrier for accommodating the one or more substrates to the buffer chamber and at a vacuum condition while the one or more substrates are transferred from the buffer chamber to the antechamber, wherein the buffer chamber is equipped with a loading port for loading the carrier at a top or a side portion thereof. - View Dependent Claims (2)
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3. A substrate processing apparatus comprising:
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a process room for treating one or more substrates;
an antechamber of a loadlock type installed to be adjoined to the process room; and
a buffer chamber installed to be adjoined to the antechamber, the buffer chamber being maintained at an atmospheric pressure while the one or more substrates are transferred from a carrier for accommodating the one or more substrates to the buffer chamber and at a vacuum condition while the one or more substrates are transferred from the buffer chamber to the antechamber, wherein the antechamber is equipped with a stocker for storing one or more product substrates or/and one or more dummy substrates therein.
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4. A substrate processing apparatus comprising:
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a process room for treating one or more substrates;
an antechamber installed to be adjoined to the process room, the antechamber being of a loadlock type; and
an elevator for loading the one or more substrates to and unloading the one or more substrates from the process room, the elevator being installed in the antechamber, wherein the elevator is arranged at a corner portion of the antechamber in order to reduce dead space.
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5. A method for fabricating a semiconductor device comprising the steps of:
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transferring one or more substrates from a carrier for accommodating the one or more substrates to a buffer chamber at an atmospheric pressure;
transferring the one or more substrates from the buffer chamber to an antechamber of a loadlock type at a vacuum condition;
transferring the one or more substrates from the antechamber to a process room at a vacuum condition; and
processing the one or more substrates in the process room, wherein the buffer chamber is installed to be adjoined to the antechamber, the buffer chamber is equipped with a loading port for loading the carrier at a top or a side portion thereof, and the antechamber is installed to be adjoined to the process room.
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Specification