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Integrated circuit having stress migration test structure and method therefor

  • US 20030080766A1
  • Filed: 10/31/2001
  • Published: 05/01/2003
  • Est. Priority Date: 10/31/2001
  • Status: Active Grant
First Claim
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1. An integrated circuit, comprising:

  • a substrate having circuits fabricated thereon, the circuits connected to leads of the integrated circuit;

    a stress migration test device fabricated on the substrate, the stress migration test device comprising a conductive runner, the conductive runner having a length sufficient to develop axial stress above the threshold for nucleating voids for the technology in which the runner is fabricated, the conductive runner having a plurality of taps at uniform impedance intervals along the runner, the taps spaced along the runner such that the variation of impedance of the runner between adjacent taps due to presence of a stress migration void in the conductive runner is a detectable portion of the impedance between the adjacent taps absent stress migration voids;

    a constant current source coupled to the stress migration test device for driving a known current into the conductive runner;

    a plurality of switches capable of providing selected ones of the taps to first and second output nodes; and

    a control circuit for controlling the state of the plurality of switches to couple selected ones of the taps to the first and second output nodes.

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