Method and apparatus using an SLM

• US 20030081303A1
• Filed: 09/10/2002
• Published: 05/01/2003
• Est. Priority Date: 09/12/2001
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: Micronic Laser Systems AB (Mycronic AB)
• Inventors: Luberek, Jarek, Sandstrom, Torbjorn
• Granted Patent: US 6,965,119 B2
• Time in Patent Office: Days
• US Class Current: 359/291
• CPC Class Codes: G02B 26/0841 the reflecting element being moved or deformed by electrostatic means
• CPC Class Codes: G02B 27/46 Systems using spatial filters
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Abstract

An aspect of the present invention includes

The present invention relates to a method for calibrating elements in a spatial light modulator (SLM) as a function of an applied element control signal. A plurality of elements are calibrated simultaneously. A beam of electromagnetic radiation is projected on to at least a part of the SLM. An image of said part of said SLM is formed on a device for measuring intensity of electromagnetic radiation. Element calibrating data is generated by using the intensity data as a function of the applied element control signal by either driving a sub-matrix comprising at least two elements out of said part of the SLM to a sequence of applied element control signals or by seeking out the control signal for each element which give the same predetermined intensity value on the device for measuring the intensity of electromagnetic radiation and stepping through N different predetermined intensity values. The invention also relates to an apparatus for patterning a workpiece having such a calibration method. Other aspects of the present invention are reflected in the detailed description, figures and claims.

Claims

1. A method for calibrating elements in a spatial light modulator (SLM) as a function of a control signal, comprising the actions of:

projecting electromagnetic radiation onto elements in at least a part of the SLM;

relaying at least part of said electromagnetic radiation through a spatial filter in a Fourier plane onto a detector arrangement that measures doses of the electromagnetic radiation;

varying at least two of the elements that are non-adjacent through a first sequence of analog control signals while measuring the doses that result; and

computing element response curves from the measured doses.

2. The method according to claim 1, further comprising the actions of:

repeating the steps of;

based on the element response curves, determining an average minimum measured intensity of the elements;

setting the elements to the average minimum measured intensity;

varying the at least two elements that are non-adjacent through a further sequence of control signals while further measuring the doses that result;

computing refined element response curves from the further measured doses;

terminating the repetition when the average minimum measured intensity has converged according to a predetermined criteria.

3. The method according to claim 1, further comprising the actions of:

repeating the steps of;

based on the element response curves, determining an upper bound on respective minimum measured doses of the elements;

setting the elements to the upper bound;

varying that at least two elements that are non-adjacent through a further sequence of control signals while further measuring the doses that result;

computing refined element response curves from the further measured doses; and

terminating the repetition when the upper bound on the respective minimum measured doses has converged according to a predetermined criteria.

4. The method of claim 1, further comprising repeating the steps of that claim for additional sets of at least two elements that are non-adjacent for substantially all of the elements in the section of the SLM.

5. The method of claim 2, further comprising repeating the steps of that claim for additional sets of at least two elements that are non-adjacent for substantially all of the elements in the section of the SLM.

6. The method of claim 3, further comprising repeating the steps of that claim for additional sets of at least two elements that are non-adjacent for substantially all of the elements in the section of the SLM.

7. The method according to claim 1, further comprising the action of:

mapping the elements in the SLM and in relation to elements in the detector arrangement.

8. The method according to claim 2, further comprising the action of:

computing refined element response curves for one or more remaining parts of the SLM.

9. The method according to claim 3, further comprising the action of:

computing refined element response curves for one or more remaining parts of the SLM.

10. The method according to claim 1, wherein the at least two non-adjacent elements are separated sufficiently that the measured doses corresponding to one of the at least two non-adjacent elements are essentially independent of the measured doses corresponding to any other of the at least two non-adjacent elements.

11. The method according to claim 1, wherein the at least two non-adjacent elements are separated sufficiently that relayed electromagnetic radiation from one of the at least two non-adjacent elements is substantially non-overlapping with relayed electromagnetic radiation from any other of the at least two non-adjacent elements.

12. The method according to claim 1, wherein said detector arrangement is a CCD-camera.

13. The method according to claim 1, wherein said electromagnetic radiation is a pulsed laser.

14. The method according to claim 13, wherein the computing step further includes:

integrating the measured doses resulting from a plurality of laser pulses.

15. The method according to claim 13, further comprising the action of:

correcting for pulse energy variations.

16. The method according to claim 14, further comprising the action of:

correcting for pulse energy variations.

17. The method according to claim 11, further including repeating said method for additional sets of at least two elements, wherein the sequences of control signals and patterns formed by the at least two elements may vary among the sets.

18. The method according to claim 2, further including the action of deriving functional approximations for the refined element response curves.

19. The method according to claim 3, further including the action of deriving functional approximations for the refined element response curves.

20. The method according to claim 18, wherein said functional approximations are stored in a look up table.

21. An apparatus for patterning a work piece arranged at an image plane and sensitive to electromagnetic radiation, comprising:

a source emitting electromagnetic radiation onto an object plane;

a computer-controlled spatial light modulator (SLM) comprising a plurality of elements, adapted to receive said electromagnetic radiation at said object plane and to relay said electromagnetic radiation toward said work piece; and

an optical projection system comprising a Fourier filter adapted to filter said relayed electromagnetic radiation in a Fourier space and at least one lens arrangement; and

logic operable on the computer-controlled SLM to calibrate the elements according to the method of claim 1.

22. A method for calibrating multi-value elements in a Spatial Light Modulator (SLM), comprising the actions of:

mapping elements of an SLM to corresponding elements of a detector arrangement;

repeating the steps of;

setting multi-value control signals for a set of the SLM elements to produce a target dose;

relaying electromagnetic radiation from the set of SLM elements through a spatial filter in a Fourier plane onto a detector arrangement to measure doses of the electromagnetic radiation;

adjusting the multi-value control signals for the set of the SLM elements corresponding to an individuated difference between the measured doses and the target dose at the detector arrangement; and

terminating the repetition when the difference between the measured dose and the target dose satisfies a predetermined criteria.

23. The method of claim 22, wherein the repeating of steps is carried out for at least three target intensity values.

24. The method of claim 23, wherein at least two of the target intensity values are selected to set a dynamic range of measured doses of the elements.

25. The method of claim 22, further comprising computing element calibration data from the modified control signals and target intensity values.

26. The method according to claim 22, further comprising the action of:

further including repeating said method for additional sections of the SLM.

27. The method according to claim 22, further comprising the action of:

mapping the elements in the SLM in relation to elements in the detector arrangement.

28. The method according to claim 22, wherein said detector arrangement is a CCD-camera.

29. The method according to claim 22, wherein said electromagnetic radiation is a pulsed laser.

30. The method according to claim 23, wherein said measured values are stored in a look up table.

31. The method according to claim 22, further comprising the action of:

further including repeating said method for additional sections of the SLM.

32. The method according to claim 22, further comprising the action of:

mapping the elements in the SLM in relation to elements in the detector arrangement.

33. The method according to claim 22, wherein said detector arrangement is a CCD-camera.

34. An apparatus for patterning a work piece arranged at an image plane and sensitive to electromagnetic radiation, comprising:

a source emitting electromagnetic radiation onto an object plane;

a computer-controlled spatial light modulator (SLM) comprising a plurality of elements, adapted to receive said electromagnetic radiation at said object plane and to relay said electromagnetic radiation toward said work piece; and

an optical projection system comprising a Fourier filter adapted to filter said relayed electromagnetic radiation in a Fourier space and at least one lens arrangement; and

logic operable on the computer-controlled SLM to calibrate the elements according to the method of claim 22.

35. A method for calibrating phase-modulated elements in a Spatial Light Modulator (SLM), comprising the actions of:

mapping the elements of the SLM to corresponding elements of a detector arrangement;

repeating the steps of;

setting phase-modulation control signals for a set of the SLM elements to produce a target dose;

relaying electromagnetic radiation from the set of the SLM elements through a filter that transforms phase-modulated radiation into amplitude-modulated radiation and onto a detector arrangement to measure doses of the electromagnetic radiation;

adjusting the phase-modulation control signals for the set of the SLM elements corresponding to an individuated difference between the measured doses and the target dose at the detector arrangement; and

terminating the repetition when the difference between the measured dose and the target dose satisfies a predetermined criteria.

36. The method of claim 35, wherein the repeating of steps is carried out for at least three target intensity values.

37. The method of claim 36, wherein at least two of the target intensity values are selected to set a dynamic range of measured doses of the elements.

38. The method of claim 36, further comprising computing element calibration data from the modified control signals and target intensity values.

39. The method according to claim 38, wherein said element calibrating data are a number of constants in a predetermined formula.

40. The method according to claim 35, wherein said electromagnetic radiation is a pulsed laser.

41. The method according to claim 38, wherein said element calibrating data are a number of constants in a predetermined formula.

42. The method according to claim 35, wherein said measured values are stored in a look up table.