Composition for film formation, method of film formation, and silica-based film

• US 20030091838A1
• Filed: 10/15/2002
• Published: 05/15/2003
• Est. Priority Date: 04/10/2000
• Status: Active Grant

• Current Assignee: JSR Corporation
• Original Assignee: JSR Corporation
• Inventors: Seo, Youngsoo, Yamada, Kinji, Hayashi, Eiji, Hasegawa, Kouichi, Nishikawa, Michinori
• Granted Patent: US 7,128,976 B2
• Time in Patent Office: Days
• US Class Current: 428/447
• CPC Class Codes: C08G 77/08 characterised by the catalysts used
• CPC Class Codes: C08G 77/50 by carbon linkages C08G77/485 takes precedence
• CPC Class Codes: C09D 183/04 Polysiloxanes
• CPC Class Codes: C09D 183/14 in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms C09D183/10 takes precedence
• CPC Class Codes: H01L 21/02126 the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
• CPC Class Codes: H01L 21/02216 the compound being a molecule comprising at least one silicon-oxygen bond and the compound having hydrogen or an organic group attached to the silicon or oxygen, e.g. a siloxane
• CPC Class Codes: H01L 21/02282 liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
• CPC Class Codes: H01L 21/3122 layers comprising polysiloxane compounds
• CPC Class Codes: Y10T 428/31663 As siloxane, silicone or silane

Abstract

A composition for film formation which comprises:

(A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one silane compound selected from the group consisting of compounds represented by the formula (1), compounds represented by the formula (2), and compounds represented by the formula (3) in the presence of water and an ammonium compound, and

(B) an organic solvent.

Claims

1. A composition for film formation which comprises:

(A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one silane compound selected from the group consisting of compounds represented by the following formula (1), compounds represented by the following formula (2), and compounds represented by the following formula (3) in the presence of water and an ammonium compound,

R_aSi(OR¹)_4-a 

 

(1)

wherein R represents a hydrogen atom, a fluorine atom, or a monovalent organic group;

R¹ represents a monovalent organic group; and

a is an integer of 1 or 2;

Si(OR²)₄ 

 

(2)

wherein R² represents a monovalent organic group;

R³_b(R⁴O)_3-bSi—

(R⁷)_d—

Si(OR⁵)_3-cR⁶_c 

 

(3)

wherein R³ to R⁶ may be the same or different and each represents a monovalent organic group;

b and c may be the same or different and each is a number of 0 to 2;

R⁷ represents an oxygen atom, a phenylene group, or a group represented by —

(CH₂)_n—

, wherein n is an integer of 1 to 6; and

d is 0 or 1; and

(B) an organic solvent.

2. The composition for film formation as claimed in claim 1, wherein the ammonium compound is formed using (a) a nitrogen-containing compound and (b) at least one member selected from the group consisting of anionic group-containing compounds and halogen compounds.

3. The composition for film formation as claimed in claim 1, wherein the nitrogen-containing compound (a) is selected from the group consisting of compounds represented by the following formulas (5) and (6).

(R¹⁰R¹¹R¹²R¹³N)_fR¹⁴ 

 

(5) R¹⁵(R¹⁶)_h 

 

(6)

wherein R¹⁰ to R¹³ may be the same or different and each represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a hydroxyalkyl group, an aryl group or an arylalkyl group;

R¹⁴ represents a halogen atom or an anionic group having a valency of 1 to 4;

f is an integer of 1 to 4;

R¹⁵ represents a nitrogen-containing cyclic cationic group having a valency of g;

R¹⁶ represents a halogen atom or an anionic group having a valency of i;

i is an integer of 1 to 4;

g is an integer of 1 to i; and

i·

h≦

g.

4. The composition for film formation of claim 1, wherein the at least one compound selected from the group consisting of tetraalkylammonium hydroxides, alicyclic organic amines, and metal hydroxides is used in an amount of from 0.00001 to 10 mol per mol of all the alkoxyl groups of the silane compound.

5. The composition for film formation of claim 1, which has a pH of 7 or lower.

6. The composition for film formation of claim 1, wherein the organic solvent (B) comprises a solvent represented by the following formula (4):

R⁸O(CHCH₃CH₂O)_eR⁹ 

 

(4)

wherein R⁸ and R⁹ each independently represents a hydrogen atom or a monovalent organic group selected from the group consisting of alkyl groups having 1 to 4 carbon atoms and CH₃CO—

; and

e is an integer of 1 or 2.

7. A method of film formation which comprises applying the composition for film formation of any one of claims 1 to 5 to a substrate and then heating the resultant coating.

8. A silica-based film obtained by the method of film formation of claim 7.