Baffle plate, apparatus for producing the same, method of producing the same, and gas processing apparatus containing baffle plate
First Claim
1. A baffle plate that parts a process space in which a chemical process is carried out with a supplied gas from a duct that is adjacent to the process space for discharging an exhaust gas generated as a result of the chemical process, said baffle plate characterized in that, after a plurality of through holes are virtually formed at desired locations on the baffle plate, the plurality of through holes are actually formed at the desired location so that flow rates of the exhaust gas at the plurality of through holes become uniform.
1 Assignment
0 Petitions
Accused Products
Abstract
The present invention provides a gas process apparatus that realizes uniform exhaust without depending on process conditions, a gas process chamber that constitutes the gas process apparatus, a baffle plate mounted on the gas process chamber, a method of producing the baffle plate, and an apparatus for producing the baffle plate. The baffle plate of the present invention serves as a partition between a process space in which a chemical process is carried out with a supplied gas, and a duct that is adjacent to the process space and functions to discharge exhaust gas generated as a result of the chemical process. In accordance with the difference between the pressures on both sides of the baffle plate, which difference varies depending on the location on the baffle plate, the baffle holes are disposed on a plurality of locations on the baffle plate.
-
Citations
16 Claims
-
1. A baffle plate that parts a process space in which a chemical process is carried out with a supplied gas from a duct that is adjacent to the process space for discharging an exhaust gas generated as a result of the chemical process,
said baffle plate characterized in that, after a plurality of through holes are virtually formed at desired locations on the baffle plate, the plurality of through holes are actually formed at the desired location so that flow rates of the exhaust gas at the plurality of through holes become uniform.
-
2. A baffle plate that parts a process space in which a chemical process is carried out with a supplied gas from a duct that is adjacent to the process space for discharging an exhaust gas generated as a result of the chemical process,
said baffle plate characterized in that, through holes are formed at a plurality of locations on the baffle plate, depending on pressure differences between two sides of the baffle plate.
-
7. A baffle plate that parts a process space in which a chemical process is carried out with a supplied gas from a duct that is adjacent to the process space for discharging an exhaust gas generated as a result of the chemical process, and a plurality of through holes are formed at desired locations,
said baffle plate characterized in that, the baffle plate varies in thickness at two or more locations among the desired locations.
-
8. A baffle plate that parts a process space in which a chemical process is carried out with a supplied gas from a duct for exhausting an exhaust gas generated as a result of the chemical process,
said baffle plate characterized in that, slits that penetrate through the baffle plate and vary in width along with a flowing path of the exhaust gas in the duct are formed in accordance with pressure differences between both sides of the baffle plate, the pressure differences varying depending on locations on the baffle plate.
-
9. A baffle plate that parts a process space in which a chemical process is carried out with a supplied gas from a duct that is adjacent to the process space so as to discharge an exhaust gas generated as a result of the chemical process,
said baffle plate characterized in that slits that penetrate through the baffle plate and have uniform widths are formed along a flowing path of the exhaust gas inside the duct, and the baffle plate varies in thickness along the flowing path.
-
10. A gas process apparatus that comprises:
- a process space including a stand on which an object to be processed is placed, and a gas supply unit for supplying a gas to the object to be processed so as to perform a chemical process on the object placed on the stand;
a duct that is adjacent to the process space so as to discharge an exhaust gas generated as a result of the chemical process; and
a discharging unit that is connected to the duct for discharging the exhaust gas,said gas process apparatus characterized by further comprising a partition unit that parts the duct from the process space, and adjusts a flow rate of the exhaust gas flowing from the process space to the duct depending on pressure differences between both sides of a boundary surface, the pressure differences varying with locations on the boundary surface between the process space and the duct.
- a process space including a stand on which an object to be processed is placed, and a gas supply unit for supplying a gas to the object to be processed so as to perform a chemical process on the object placed on the stand;
-
11. A method of producing a baffle plate that parts a process space in which a chemical process is carried out with a supplied gas from a duct that is adjacent to the process space so as to discharge an exhaust gas generated as a result of the chemical process,
said method comprising the steps of: -
calculating pressure differences between both sides of the baffle at desired locations on the baffle plate; and
forming through holes at a plurality of locations on the baffle plate, depending on the calculated pressure differences.
-
-
12. A method of producing a baffle plate that parts a process space in which a chemical process is carried out with a supplied gas from a duct that is adjacent to the process space so as to discharge an exhaust gas generated as a result of the chemical process,
said method comprising the steps of: -
calculating pressure differences between both sides of the baffle plate, the pressure differences varying with locations on the baffle plate, and a pressure variation of the exhaust gas along a flowing path of the exhaust gas inside the duct; and
forming through holes at a plurality of locations on the baffle plate in accordance with the calculated pressure differences and the pressure variation.
-
-
13. A method of producing a baffle plate that parts a process space in which a chemical process is carried out with a supplied gas from a duct that is adjacent to the process space for discharging an exhaust gas generated as a result of the chemical process,
said method comprising the step of forming a plurality of through holes in the baffle plate so that a flow rate of the exhaust gas calculated in accordance with the Hagen-Poiseuille'"'"'s law becomes constant.
-
14. An apparatus for producing a baffle plate that parts a process space in which a chemical process is carried out with a supplied gas from a duct that is adjacent to the process space for discharging an exhaust gas generated as a result of the chemical process,
said apparatus comprising: -
a calculating unit that calculates pressure differences between both sides of the baffle plate at various locations on the baffle plate; and
a hole forming unit that forms through holes at a plurality of locations on the baffle plate in accordance with the pressure differences calculated by the calculating unit. - View Dependent Claims (15)
-
-
16. An apparatus for producing a baffle plate that parts a process space in which a chemical process is carried out with a supplied gas from a duct that is adjacent to the process space for discharging an exhaust gas generated as a result of the chemical process,
said apparatus comprising: -
a calculating unit that calculates hole forming locations so that flow rates of the exhaust gas at through holes formed in the baffle plate calculated in accordance with the Hagen-Poiseuille'"'"'s law become uniform; and
a hole forming unit that forms the through holes at the hole forming locations calculated by the calculating unit.
-
Specification