Inductor and method for adjusting the inductance thereof
First Claim
1. An inductor comprising:
- a substantially rectangular insulation substrate; and
at least one coil pattern disposed on the insulation substrate and made of photolithographic material;
wherein, in the coil pattern, an electrode width of a portion of the pattern provided in the vicinity of at least one short side of two short sides of the substantially rectangular insulation substrate so as to be substantially parallel to the short side is wider than an electrode width of the other portion of the pattern.
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Accused Products
Abstract
A spiral coil pattern is formed on a substantially rectangular insulation substrate of an inductor by photolithography. In the coil pattern, the electrode width of a portion of the pattern provided in the vicinity of the right short side of the substrate so as to be substantially parallel to the short side is wider than the electrode width of the other portion of the pattern. The interelectrode spacing of a portion of the pattern is wider than the interelectrode spacing of the other portion of the pattern. When the inductance of the inductor is required to be reduced to make the inductance a desired inductance value, the electrode width of the portion of the coil pattern is made wider in the inner direction of the coil pattern than the original electrode width.
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Citations
20 Claims
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1. An inductor comprising:
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a substantially rectangular insulation substrate; and
at least one coil pattern disposed on the insulation substrate and made of photolithographic material;
wherein, in the coil pattern, an electrode width of a portion of the pattern provided in the vicinity of at least one short side of two short sides of the substantially rectangular insulation substrate so as to be substantially parallel to the short side is wider than an electrode width of the other portion of the pattern. - View Dependent Claims (2, 3, 4)
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5. An inductor comprising:
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a substantially rectangular insulation substrate; and
at least one coil pattern disposed on the insulation substrate and made of photolithographic material;
wherein, in the coil pattern, an interelectrode spacing of a portion of the pattern provided in the vicinity of at least one short side of two short sides of the substantially rectangular insulation substrate so as to be substantially parallel to the short side is wider than an interelectrode spacing of the other portion of the pattern. - View Dependent Claims (6, 7, 8)
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- 9. A method for adjusting the inductance value of an inductor comprising a substantially rectangular insulation substrate and at least one coil pattern formed by photolithography, wherein, in the coil pattern, the inductance value is adjusted by increasing or decreasing the electrode width of a portion of the pattern provided in the vicinity of at least one short side of the substantially rectangular insulation substrate so as to be substantially parallel to the short side.
- 12. A method for adjusting the inductance value of an inductor comprising a substantially rectangular insulation substrate and at least one coil pattern formed by photolithography, wherein, in the coil pattern, the inductance value is adjusted by increasing or decreasing the interelectrode spacing of a portion of the pattern provided in the vicinity of at least one short side of the substantially rectangular insulation substrate so as to be substantially parallel to the short side.
- 15. A method for adjusting the inductance value of an inductor comprising a substantially rectangular insulation substrate and at least one coil pattern formed by photolithography, wherein, in the coil pattern, the inductance value is increased by decreasing the electrode width of a portion of the pattern provided in the vicinity of at least one long side of the substantially rectangular insulation substrate so as to be substantially parallel to the long side.
- 18. A method for adjusting the inductance value of an inductor comprising a substantially rectangular insulation substrate and at least one coil pattern formed by photolithography, wherein, in the coil pattern, the inductance value is increased by decreasing the interelectrode spacing of a portion of the pattern provided in the vicinity of at least one long side of the substantially rectangular insulation substrate so as to be substantially parallel to the long side.
Specification