Magnetic head, method of manufacturing same, and head suspension assembly

• US 20030099069A1
• Filed: 10/03/2002
• Published: 05/29/2003
• Est. Priority Date: 10/10/2001
• Status: Abandoned Application

• Current Assignee: TDK Corporation
• Original Assignee: TDK Corporation
• Inventors: Kagami, Takeo, Nagai, Kentaro, Ueda, Kunihiro, Saruki, Shunji
• Application Number:
  US10/262,913
• Publication Number:
  US 20030099069A1
• Time in Patent Office: Days
• US Class Current: 360/313
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 25/00 Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
• CPC Class Codes: G11B 2005/3996 large or giant magnetoresistive effects [GMR], e.g. as generated in spin-valve [SV] devices
• CPC Class Codes: G11B 5/3106 where the integrated or assembled structure comprises means for conditioning against physical detrimental influence, e.g. wear, contamination G11B5/3133 takes precedence
• CPC Class Codes: G11B 5/3116 Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks G11B5/3113, G11B5/245 take precedence
• CPC Class Codes: G11B 5/3903 using magnetic thin film layers or their effects, the films being part of integrated structures
• CPC Class Codes: G11B 5/40 Protective measures on heads, e.g. against excessive temperature G11B5/31 takes precedence; protection against wear G11B5/255 ; protective structure of the head: see under structures, e.g. G11B5/3106
• CPC Class Codes: G11B 5/488 Disposition of heads G11B5/49, G11B5/52 take precedence
• CPC Class Codes: Y10T 29/49032 Fabricating head structure or component thereof
• CPC Class Codes: Y10T 29/49041 with significant slider/housing shaping or treating
• CPC Class Codes: Y10T 29/49046 with etching or machining of magnetic material
• CPC Class Codes: Y10T 29/49048 Machining magnetic material [e.g., grinding, etching, polishing]
• CPC Class Codes: Y10T 29/49052 by etching

Abstract

A method of manufacturing a magnetic head manufactures a magnetic head having a base, and a laminate stacked on the base and including a magneto-resistive device. The method mechanically polishes a surface of a structure including the base and the laminate close to a magnetic recording medium, wherein the surface of the structure includes an end face of the laminate including an end face of the magneto-resistive device and a surface of the base. Next, the method selectively etches a first region on the surface of the structure close to the magnetic recording medium, wherein the first region includes the surface of the base but does not include the end face of the magneto-resistive device. Subsequently, the method entirely etches the surface of the structure close to the magnetic recording medium.

Claims

1. A method of manufacturing a magnetic head having a base, and a laminate stacked on said base and including a magneto-resistive device, said method comprising:

a polishing step for mechanically polishing a surface of a structure including said base and said laminate close to a magnetic recording medium, said surface of said structure including an end face of said laminate including an end face of said magneto-resistive device and a surface of said base; and

a first etching step after said polishing step for selectively etching a first region on the surface of said structure close to the magnetic recording medium, said first region including the surface of said base but not including the end face of said magneto-resistive device.

2. A method of manufacturing a magnetic head according to claim 1, further comprising:

a second etching step after said polishing step and before or after said first etching step for entirely etching the surface of said structure close to the magnetic recording medium.

3. A method of manufacturing a magnetic head according to claim 1, wherein:

said laminate comprises a first and a second magnetic shield film formed on said base to sandwich said magneto-resistive device;

said surface of said structure close to the magnetic recording medium includes end faces of said first and second magnetic shield films close to the magnetic recording medium; and

said first region does not include end faces of said first and second magnetic shield films.

4. A method of manufacturing a magnetic head according to claim 1, wherein said first etching step comprises the steps of:

forming a resist on a region on the surface of said structure close to the magnetic recording medium except for said first region before the etching in said first etching step; and

removing said resist after the etching in said first etching step.

5. A method of manufacturing a magnetic head according to claim 1, wherein said first region substantially solely includes the surface of said base on the surface of said structure close to the magnetic recording medium.

6. A method of manufacturing a magnetic head according to claim 1, wherein said first region includes a predetermined region on the end face of said laminate close to said base on the surface of said structure close to the magnetic recording medium.

7. A method of manufacturing a magnetic head according to claim 1, further comprising the step of setting a target region for said first region, said target region including a region on the surface of said base on the surface of said structure close to the magnetic recording medium, and a predetermined region close to said base in a region on the end face of said laminate on the surface of said structure close to the magnetic recording medium.

8. A method of manufacturing a magnetic head according to claim 7, wherein said predetermined region in said target region set for said first region has a width in a range of 0.05 μ

m to 3.0 μ

m.

9. A method of manufacturing a magnetic head according to claim 1, further comprising:

a second etching step after said polishing step and before or after said first etching step for selectively etching a second region on the surface of said structure close to the magnetic recording medium, said second region not including the surface of said base but including the end face of said magneto-resistive device.

10. A method of manufacturing a magnetic head according to claim 1, wherein said base is made of Al₂O₃—

TiC or SiC.

18. A head suspension assembly comprising:

a magnetic head manufactured by the method of manufacturing a magnetic head according to claim 1;

and

a suspension for supporting said magnetic head near a leading end thereof.

11. A magnetic head comprising:

a base having a surface for forming an air bearing surface directly or through a protection film, said surface being located close to a magnetic recording medium; and

a laminate stacked on said base and including a magneto-resistive device,

wherein said surface of said base close to the magnetic recording medium differs in level from an end face of said magneto-resistive device close to the magnetic recording medium by 2 nm or less in absolute value.

12. A magnetic head according to claim 11, wherein said laminate includes a groove formed on the end face close to the magnetic recording medium, said groove extending along a boundary between said surface of said base close to the magnetic recording medium, said surface forming the air bearing surface directly or through the protection film, and said end face of said laminate close to the magnetic recording medium.

13. A magnetic head comprising:

a base having a surface for forming an air bearing surface directly or through a protection film, said surface being located close to a magnetic recording medium; and

a laminate stacked on said base and including a magneto-resistive device, and a first and a second magnetic shield film formed on said base to sandwich said magneto-resistive device,

wherein said surface of said base close to the magnetic recording medium differs in level from an end face of at least one of said first and second magnetic shield films close to the magnetic recording medium by 2 nm or less in absolute value.

14. A magnetic head according to claim 13, wherein said laminate includes a groove formed on the end face close to the magnetic recording medium, said groove extending along a boundary between said surface of said base close to the magnetic recording medium, said surface forming the air bearing surface directly or through the protection film, and said end face of said laminate close to the magnetic recording medium.

15. A magnetic head according to claim 14, wherein said groove has a depth of 30 nm or less with reference to said surface of said base close to the magnetic recording medium, said surface forming the air bearing surface directly or through the protection film.

16. A magnetic head comprising:

a base having a surface for forming an air bearing surface directly or through a protection film, said surface being located close to a magnetic recording medium; and

a laminate stacked on said base and including a magneto-resistive device;

wherein said laminate includes a groove formed on the end face close to the magnetic recording medium, said groove extending along a boundary between said surface of said base close to the magnetic recording medium and said end face of said laminate close to the magnetic recording medium.

17. A magnetic head according to claim 16, wherein said groove has a depth of 30 nm or less with reference to said surface of said base close to the magnetic recording medium, said surface forming the air bearing surface directly or through the protection film.