×

Method and system of monitoring apparatuses of manufacturing IC

  • US 20030100970A1
  • Filed: 11/29/2001
  • Published: 05/29/2003
  • Est. Priority Date: 11/29/2001
  • Status: Active Grant
First Claim
Patent Images

1. A method of monitoring apparatuses of manufacturing integrated circuit (IC), while a plurality of lots of wafers are processed by a plurality of apparatuses, used for monitoring a plurality of apparatus events, the method of monitoring apparatuses of manufacturing IC comprising:

  • providing a database with a plurality of data of the apparatus events;

    downloading the data of the apparatus events from the database;

    calculating a plurality of achievement indices by using the data of the apparatus events;

    establishing a control chart by using the achievement indices;

    establishing a knowledge archive of rules by using the data of the apparatus events, the achievement indices, and the control chart, and determining a plurality of limitative rules to detect an abnormal point;

    forming a calendar file by sorting the data of the apparatus events with time; and

    executing a step of replaying the apparatus events so as to proceed a rectification.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×