Method and system of monitoring apparatuses of manufacturing IC
First Claim
1. A method of monitoring apparatuses of manufacturing integrated circuit (IC), while a plurality of lots of wafers are processed by a plurality of apparatuses, used for monitoring a plurality of apparatus events, the method of monitoring apparatuses of manufacturing IC comprising:
- providing a database with a plurality of data of the apparatus events;
downloading the data of the apparatus events from the database;
calculating a plurality of achievement indices by using the data of the apparatus events;
establishing a control chart by using the achievement indices;
establishing a knowledge archive of rules by using the data of the apparatus events, the achievement indices, and the control chart, and determining a plurality of limitative rules to detect an abnormal point;
forming a calendar file by sorting the data of the apparatus events with time; and
executing a step of replaying the apparatus events so as to proceed a rectification.
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Accused Products
Abstract
A method and system of monitoring apparatuses of manufacturing integrated circuit (IC) detects the problems during wafers processing by replaying the apparatus events. First, the method and system download the data of apparatus events, and then calculate the achievement indices. Then, the method and system establish the control chart to determined limitative rules, and execute the replaying system by establishing the computer interface system therewith to detect the abnormal point so as to proceed a rectification. The method and system of monitoring apparatuses of manufacturing IC review the past achievements by establishing a model for replaying apparatus history and achievements, and foresee the future problems by establishing control charts and a knowledge archive of rules.
14 Citations
20 Claims
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1. A method of monitoring apparatuses of manufacturing integrated circuit (IC), while a plurality of lots of wafers are processed by a plurality of apparatuses, used for monitoring a plurality of apparatus events, the method of monitoring apparatuses of manufacturing IC comprising:
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providing a database with a plurality of data of the apparatus events;
downloading the data of the apparatus events from the database;
calculating a plurality of achievement indices by using the data of the apparatus events;
establishing a control chart by using the achievement indices;
establishing a knowledge archive of rules by using the data of the apparatus events, the achievement indices, and the control chart, and determining a plurality of limitative rules to detect an abnormal point;
forming a calendar file by sorting the data of the apparatus events with time; and
executing a step of replaying the apparatus events so as to proceed a rectification. - View Dependent Claims (2, 3, 4, 5, 6, 7, 13)
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8. A method of monitoring apparatuses of manufacturing integrated circuit (IC), while a plurality of lot s of wafers are processed by a plurality of apparatuses, used for monitoring a plurality of apparatus events, the method of monitoring apparatuses of manufacturing IC comprising:
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providing a database with a plurality of data of the apparatus events;
downloading the data of the apparatus events from the database;
calculating a plurality of achievement indices by using the data of the apparatus events;
establishing a control chart by using the achievement indices;
establishing a knowledge archive of rules by using the data of the apparatus events, the achievement indices, and the control chart;
forming a calendar file by sorting the data of apparatus events with time; and
executing a step of replaying apparatus events by a apparatus replaying system so as to read the apparatus events. - View Dependent Claims (9, 10, 11, 12, 14, 15)
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16. A system of monitoring apparatuses of manufacturing IC, to monitor a plurality of the apparatus events, wherein a plurality of apparatuses process a plurality of lots of wafers with a plurality of steps, the system of monitoring apparatuses of manufacturing IC comprising:
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a control mainframe for controlling the apparatuses;
a data mainframe with a plurality of operation parameters for recording a plurality of data of the apparatus events and a plurality of process data; and
a control mainframe for executing a process of monitoring the apparatuses by replaying the apparatus events processing the lots of wafers, the process of monitoring apparatuses comprising;
downloading the data of the apparatus events from the data mainframe;
calculating a plurality of achievement indices by using the data of the apparatus events;
establishing a control chart by using the achievement indices;
establishing a knowledge archive of rules by using the data of the apparatus events, the achievement indices, and the control chart, and determining a plurality of limitative rules to detect an abnormal point;
forming a calendar file by sorting the data of apparatus events with time; and
executing a step of replaying apparatus events so as to proceed a rectification. - View Dependent Claims (17, 18, 19, 20)
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Specification