Surface smoothing device and method thereof
First Claim
1. A surface smoothing device comprising:
- an operating gas supplying device for supplying operating gas;
a diffusion chamber connected to a convergent and divergent nozzle which changes the operating gas supplied from the operating gas supplying device into cluster state;
a source chamber including a skimmer connected to the diffusion chamber for extracting a part of the operating gas in cluster state, and an ionizing device for ionizing the operating gas of cluster state selected by the skimmer;
an acceleration chamber including a lens for increasing a cluster ion beam current, and an accelerating device for accelerating the cluster ion; and
a process chamber in which the accelerated cluster ion is irradiated on a sample to flatten a surface of the sample.
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Accused Products
Abstract
A surface smoothing device and method thereof which flattens a surface of a sample by irradiating ionized gas of cluster state comprises: an operating gas supplying device for supplying operating gas; a diffusion chamber connected to a convergent and divergent nozzle which changes the operating gas supplied from the operating gas supplying device into cluster state; a source chamber including a skimmer connected to the diffusion chamber for extracting a part of the operating gas in cluster state, and an ionizing device for ionizing the operating gas of cluster state selected by the skimmer; an acceleration chamber including a lens for increasing a density of the cluster ion beam current, and an accelerating device for accelerating the cluster ion; and a process chamber in which the accelerated cluster ion is irradiated on a sample of ITO thin film to flatten the surface of the sample.
19 Citations
20 Claims
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1. A surface smoothing device comprising:
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an operating gas supplying device for supplying operating gas;
a diffusion chamber connected to a convergent and divergent nozzle which changes the operating gas supplied from the operating gas supplying device into cluster state;
a source chamber including a skimmer connected to the diffusion chamber for extracting a part of the operating gas in cluster state, and an ionizing device for ionizing the operating gas of cluster state selected by the skimmer;
an acceleration chamber including a lens for increasing a cluster ion beam current, and an accelerating device for accelerating the cluster ion; and
a process chamber in which the accelerated cluster ion is irradiated on a sample to flatten a surface of the sample. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A surface smoothing method comprising:
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forming cluster by passing operating gas through a convergent and divergent nozzle and adiabatically expanding the operating gas into a diffusion chamber;
extracting the generated cluster of the operating gas;
ionizing the extracted cluster;
accelerating the ionized cluster; and
flattening the surface by irradiating the accelerated cluster on a surface of a sample. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification