×

Chamber hardware design for titanium nitride atomic layer deposition

  • US 20030116087A1
  • Filed: 12/21/2001
  • Published: 06/26/2003
  • Est. Priority Date: 12/21/2001
  • Status: Abandoned Application
First Claim
Patent Images

12. A processing chamber, comprising;

  • a chamber body;

    a support pedestal disposed within the chamber body; and

    a lid assembly disposed on the chamber body, the lid assembly, comprising;

    a lid plate having an upper and lower surface;

    a manifold block disposed on the upper surface having one or more cooling channels formed therein;

    one or more valves disposed on the manifold block; and

    a distribution plate disposed on the lower surface having a plurality of apertures and one or more openings formed there-through; and

    at least two isolated flow paths formed within the lid plate, manifold block, and distribution plate;

    wherein a first flow path of the at least two isolated flow paths is in fluid communication with a first valve of the one or more valves and the one or more openings and a second flow path of the at least two isolated flow paths is in fluid communication with a second valve of the one or more valves and the plurality of apertures.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×