Chamber hardware design for titanium nitride atomic layer deposition
First Claim
12. A processing chamber, comprising;
- a chamber body;
a support pedestal disposed within the chamber body; and
a lid assembly disposed on the chamber body, the lid assembly, comprising;
a lid plate having an upper and lower surface;
a manifold block disposed on the upper surface having one or more cooling channels formed therein;
one or more valves disposed on the manifold block; and
a distribution plate disposed on the lower surface having a plurality of apertures and one or more openings formed there-through; and
at least two isolated flow paths formed within the lid plate, manifold block, and distribution plate;
wherein a first flow path of the at least two isolated flow paths is in fluid communication with a first valve of the one or more valves and the one or more openings and a second flow path of the at least two isolated flow paths is in fluid communication with a second valve of the one or more valves and the plurality of apertures.
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Accused Products
Abstract
A lid assembly and a method for ALD is provided. In one aspect, the lid assembly includes a lid plate having an upper and lower surface, a manifold block disposed on the upper surface having one or more cooling channels formed therein, and one or more valves disposed on the manifold block. The lid assembly also includes a distribution plate disposed on the lower surface having a plurality of apertures and one or more openings formed there-through, and at least two isolated flow paths formed within the lid plate, manifold block, and distribution plate. A first flow path of the at least two isolated flow paths is in fluid communication with the one or more openings and a second flow path of the at least two isolated flow paths is in fluid communication with the plurality of apertures.
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Citations
30 Claims
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12. A processing chamber, comprising;
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a chamber body;
a support pedestal disposed within the chamber body; and
a lid assembly disposed on the chamber body, the lid assembly, comprising;
a lid plate having an upper and lower surface;
a manifold block disposed on the upper surface having one or more cooling channels formed therein;
one or more valves disposed on the manifold block; and
a distribution plate disposed on the lower surface having a plurality of apertures and one or more openings formed there-through; and
at least two isolated flow paths formed within the lid plate, manifold block, and distribution plate;
wherein a first flow path of the at least two isolated flow paths is in fluid communication with a first valve of the one or more valves and the one or more openings and a second flow path of the at least two isolated flow paths is in fluid communication with a second valve of the one or more valves and the plurality of apertures. - View Dependent Claims (1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29)
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22-1. The method of claim 21, wherein the first process gas is selected from the group consisting of titanium tetrachloride, tungsten hexafluoride, tantalum pentachloride, titanium iodide, and titanium bromide.
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23-2. The method of claim 21, wherein the first process gas is selected from the group consisting of tetrakis(dimethylamido)titanium, pentakis(dimethylamido) tantalum, tetrakis(diethylamido)titanium, tungsten hexacarbonyl, tungsten hexachloride, tetrakis(diethylamido) titanium, and pentakis(diethylamido)tantalum.
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30. The method of claim 31, wherein the second process gas flows through the plurality of apertures and the first process gas flows through the one or more openings.
Specification