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Exposure apparatus, substrate processing system, and device meanufacturing method

  • US 20030117596A1
  • Filed: 12/05/2002
  • Published: 06/26/2003
  • Est. Priority Date: 04/06/2001
  • Status: Active Grant
First Claim
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1. An exposure apparatus that transfers a pattern formed on a mask onto a substrate via a projection optical system, the exposure apparatus comprising:

  • a mask stage that holds the mask;

    a substrate stage that holds the substrate;

    a first main body unit that supports at least one of the mask stage and the substrate stage;

    four first vibration isolators that support the first main body unit at four points and isolate vibration in the first main body unit;

    a second main body unit that supports the projection optical system; and

    three second vibration isolators that support the second main body unit at three points on different straight lines on the first main body unit and isolate vibration in the second main body unit.

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