Maskless photon-electron spot-grid array printer

• US 20030122091A1
• Filed: 11/07/2002
• Published: 07/03/2003
• Est. Priority Date: 11/07/2001
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Almogy, Gilad
• Granted Patent: US 6,841,787 B2
• Time in Patent Office: Days
• US Class Current: 250/492.24
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70375 Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
• CPC Class Codes: H01J 2237/1205 Microlenses
• CPC Class Codes: H01J 2237/31779 from patterned photocathode
• CPC Class Codes: H01J 37/073 Electron guns using field emission, photo emission, or secondary emission electron sources
• CPC Class Codes: H01J 37/3175 Projection methods, i.e. transfer substantially complete pattern to substrate
• CPC Class Codes: H01J 37/3177 Multi-beam, e.g. fly's eye, comb probe

Abstract

A high resolution and high data rate spot grid array printer system is provided, wherein an image representative of patterns to be recorded on a reticle or on a layer of a semiconductor die is formed by scanning a substrate with electron beams. Embodiments include a printer comprising an optical radiation source for irradiating a photon-electron converter with a plurality of substantially parallel optical beams, the optical beams being individually modulated to correspond to an image to be recorded on the substrate. The photon-electron converter produces an intermediate image composed of an array of electron beams corresponding to the modulated optical beams. A de-magnifier is interposed between the photon-electron converter and the substrate, for reducing the size of the intermediate image. A movable stage introduces a relative movement between the substrate and the photon-electron converter, such that the substrate is scanned by the electron beams.

Claims

1. Maskless lithography apparatus for exposing a substrate with an image formed by an array of electron beams, the system comprising:

a programmable optical radiation source for providing an array of optical beams modulated in response to an input data signal and forming a sequence of optical patterns;

a photon-electron converter, for converting the optical beams to electron beams and forming a sequence of electron beam patterns;

electron optics for focusing the electron beams onto the substrate; and

a translator for introducing relative movement between the substrate and the electron beams such that the substrate is exposed with a sequence of electron beam patterns forming the image.

2. The apparatus of claim 1, wherein the electron optics demagnifies the electron beam pattern.

3. The apparatus of claim 1, further comprising an optical microlens array interposed between the programmable optical radiation source and the photon-electron converter.

4. The apparatus of claim 1, wherein the programmable optical radiation source comprises an array of individually modulated lasers.

5. The apparatus of claim 1, wherein the optical radiation source comprises:

a light source; and

a programmable spatial light modulator for providing an array of optical beams individually modulated in response to the input data signal.

6. The apparatus of claim 4, further comprising an optical microlens array interposed between the programmable optical radiation source and the photon-electron converter, positioned such that there is a one-to-one correspondence between the optical beams and the elements of the microlens array.

7. The apparatus of claim 5, further comprising an optical microlens array interposed between the programmable optical radiation source and the photon-electron converter, positioned such that there is a one-to-one correspondence between the optical beams and the elements of the microlens array.

8. The apparatus of claim 3, wherein the microlenses are diffractive.

9. The apparatus of claim 1, wherein the translator is for moving the substrate along an axis slanted relative to one axis of the electron beam pattern.

10. The apparatus of claim 9, wherein the movable stage is for moving the substrate such that as the substrate is moved a distance substantially equal to a length of the electron beam array in the scanning direction, the electron beams trace a substantially continuous path on the substrate surface in a mechanical cross-scan direction.

11. The apparatus of claim 3, wherein the array of optical beams is two-dimensional.

12. The apparatus of claim 9, further comprising a compensator for compensating for inaccuracies in the movable stage movement.

13. The apparatus of claim 12 wherein the compensator comprises a servo for moving the electron beam array to compensate for mechanical inaccuracies in the movement of the stage.

14. The apparatus of claim 12, further comprising a compensator selected from the group consisting of a movable mirror, an electro-optic element and an acousto-optic element for varying an angle of incidence of the light source onto the lens array for compensating for the mechanical inacurracies in the movable stage.

15. The apparatus of claim 10, wherein the movable stage is for moving the substrate such that the electron beams overlap as they trace the continuous path on the substrate surface.

16. The apparatus of claim 1, further comprising a limiter interposed between the optical radiation source and the photon-electron converter for reducing writing errors onto the photon-electron converter.

17. The apparatus of claim 16, wherein the limiter comprises a pinhole array having pinholes corresponding to the array of optical beams from the optical radiation source.

18. The apparatus of claim 16, wherein the limiter comprises an array of apertures corresponding to the array of optical beams from the optical radiation source, each aperture having a width of at least half a wavelength of each of the optical beams.

35. The apparatus of claim 3 further comprising an optical demagnifier interposed between the optical microlens array and the photon-electron converter.

19. A method for exposing a substrate with an image, the method comprising the steps of:

generating an array of optical beams;

modulating the of light beams individually in response to an input data signal;

converting the optical beams to electron beams to provide an intermediate electron beam array;

focusing the electron beams onto the substrate to expose a the substrate to a pattern of electron beams; and

moving the substrate relative to the electron beams while the generating, modulating, converting and focusing steps are being performed to expose the substrate with an image comprising a sequence of electron beam patterns.

20. The method of claim 19, further comprising compensating for mechanical inaccuracies in the step of moving.

21. Maskless lithography apparatus comprising:

a light source;

a spatial light modulator positioned to receive light from the light source for providing an array of individually modulated optical beams in response to an input data signal;

an array of lenses for focusing each of the optical beams;

a photon-electron converter positioned at the focus of the optical beams for converting each optical beam to an electron beam;

optics interposed between the spatial light modulator and the array of lenses for mapping the beams onto lenses in a one-to-one correspondence;

an electron lens interposed between the photon-electron converter and the substrate for focusing the individual electron beams on the substrate; and

a stage for providing relative movement between the substrate and the photon-electron converter such that the image is recorded on the substrate with the array of electron beams.

22. The apparatus as in claim 21 wherein the movable stage translates the substrate in a direction slightly slanted relative to one axis of the array of electron beams.

23. Maskless lithography apparatus comprising:

a light source;

a spatial light modulator positioned to receive light from the light source for providing an array of individually modulated optical beams in response to an input signal;

an array of lenses for focusing each of the modulated optical beams;

a photon-electron converter positioned at the focus of the modulated optical beams for converting each modulated optical beam to an electron beam;

an electron demagnifier interposed between the photon-electron converter and the substrate; and

a movable stage for supporting the substrate and for introducing a relative movement between the substrate and the photon-electron converter such that the image is recorded on the substrate with the array of electron beams.

24. The apparatus as in claim 23 wherein the movable stage translates the substrate in a direction slightly slanted relative to one axis of the array of electron beams.

25. The apparatus as in claim 24 wherein the spatial light modulator is a micromirror array.

26. Maskless lithography apparatus for exposing a substrate with an image formed by an array of electron beams, the system comprising:

a programmable optical radiation source for providing an array of optical beams modulated in response to an input data signal and forming a sequence of optical patterns;

a photon-electron converter, comprising an array of optically sensitive microtips, for converting the optical beams to electron spots and forming a sequence of electron spot patterns;

electron optics for focusing electrons emitted from the electron spots onto the substrate; and

a translator for introducing relative movement between the substrate and the focused electron spots such that the substrate is exposed with a sequence of focused electron spot patterns forming the image.

27. The apparatus of claim 26, further comprising an optical microlens array interposed between the programmable optical radiation source and the photon-electron converter.

28. The apparatus of claim 26, wherein the programmable optical radiation source comprises an array of individually modulated lasers.

29. The apparatus of claim 26, wherein the optical radiation source comprises:

a light source; and

a programmable spatial light modulator for providing an array of optical beams individually modulated in response to the input data signal.

30. The apparatus of claim 28, further comprising an optical microlens array interposed between the programmable optical radiation source and the photon-electron converter, positioned such that there is a one-to-one correspondence between the optical beams and the elements of the microlens array.

31. The apparatus of claim 29, further comprising an optical microlens array interposed between the programmable optical radiation source and the photon-electron converter, positioned such that there is a one-to-one correspondence between the optical beams and the elements of the microlens array.

32. The apparatus of claim 27, wherein the microlenses are diffractive.

33. The apparatus of claim 26, wherein the translator translated the substrate along an axis slanted relative to one axis of the electron beam pattern.

34. The apparatus of claim 27, wherein the array of optical beams is two-dimensional.