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Film formation apparatus and film formation method and cleaning method

  • US 20030124764A1
  • Filed: 12/12/2002
  • Published: 07/03/2003
  • Est. Priority Date: 12/12/2001
  • Status: Active Grant
First Claim
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1. A film formation apparatus for forming a film over a substrate by depositing an organic compound material from a deposition source provided opposite to the substrate, said film formation apparatus comprising:

  • a film formation chamber to provide said substrate therein;

    a deposition source provided in said film formation chamber;

    a means provided in said film formation chamber for heating the deposition source;

    a heating means provided in said film formation chamber for heating a mask; and

    a vacuum gas discharge treatment chamber for vacuum evacuating the film formation chamber, wherein the film formation chamber is connected with the vacuum gas discharge treatment chamber.

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