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Dual-gas delivery system for chemical vapor deposition processes

  • US 20030124842A1
  • Filed: 12/27/2001
  • Published: 07/03/2003
  • Est. Priority Date: 12/27/2001
  • Status: Abandoned Application
First Claim
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1. A gas delivery system, comprising:

  • a gas box comprising a first gas channel having a first outlet and a second gas channel having a second gas outlet;

    a blocker plate disposed below the gas box, the blocker plate having a plurality of blocker plate holes;

    a showerhead disposed below the blocker plate, the showerhead comprising columns having column holes in communication with a top surface and a bottom surface of the showerhead and interconnected grooves having groove holes in communication with the bottom surface of the showerhead;

    the first outlet of the gas box adapted to supply a first gas through the blocker plate holes of the blocker plate to the column holes of the showerhead; and

    the second gas outlet of the gas box being coupled to the showerhead and adapted to supply a second gas through the interconnect grooves of the showerhead to the groove holes of the showerhead.

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