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Supercritical fluid cleaning of semiconductor substrates

  • US 20030125225A1
  • Filed: 11/25/2002
  • Published: 07/03/2003
  • Est. Priority Date: 12/31/2001
  • Status: Active Grant
First Claim
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1. A cleaning formulation useful for removing unwanted material from a surface having such unwanted material thereon, said cleaning formulation comprising a supercritical fluid, at least one co-solvent, and at least one additional active agent.

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