User interface for a network-based mask defect printability analysis system

• US 20030126581A1
• Filed: 02/20/2003
• Published: 07/03/2003
• Est. Priority Date: 09/17/1997
• Status: Active Grant

• Current Assignee: Synopsys Merger Holdings LLC (Synopsys Incorporated)
• Original Assignee: Numerical Technologies Inc. (Synopsys Incorporated)
• Inventors: Pang, Linyong, Karklin, Linard, Howard, Daniel William
• Granted Patent: US 7,003,755 B2
• Time in Patent Office: Days
• US Class Current: 716/19
• CPC Class Codes: G03F 1/26 Phase shift masks [PSM]; PSM blanks; Preparation thereof
• CPC Class Codes: G03F 1/36 Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
• CPC Class Codes: G03F 1/84 Inspecting
• CPC Class Codes: G03F 7/70441 Optical proximity correction [OPC]
• CPC Class Codes: G03F 7/705 Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
• CPC Class Codes: G06F 30/39 Circuit design at the physical level physical level design for reconfigurable circuits G06F30/347
• CPC Class Codes: G06T 2207/30148 Semiconductor; IC; Wafer
• CPC Class Codes: G06T 7/0004 Industrial image inspection
• CPC Class Codes: Y10S 977/839 Mathematical algorithms, e.g. computer software, specifically adapted for modeling configurations or properties of nanostructure
• CPC Class Codes: Y10S 977/887 Nanoimprint lithography, i.e. nanostamp
• CPC Class Codes: Y10S 977/953 Detector using nanostructure

Abstract

Mask simulation tools are typically extremely complicated to learn and to use effectively. Therefore, providing access to a mask simulation tool over a wide area network (WAN) to multiple on-line users can be very cost effective. Specifically, in a network-based simulation server, multiple users can view the same mask image, simulations, and analysis results and provide real-time comments to each other as simulation and analysis are performed, thereby encouraging invaluable problem-solving dialogue among users. The user interface for this mask simulation tool can advantageously facilitate this dialogue. For example, the user interface can include an enter box for a user to enter a message and a talk box for capturing any message sent by any user of the simulation tool using the enter box.

Claims

1. A user interface for an application accessible over a wide area network (WAN), the user interface including:

an enter box for a user of the application to enter a message;

a talk box for capturing any message transferred by any user of the application using the enter box, thereby allowing real-time communication between users of the application over the WAN; and

a viewing area for providing information relating to the mask quality application, wherein the enter box, the talk box, and the viewing area comprise an integrated environment for users of the mask quality application over the WAN.

2. The user interface of claim 1, further including a connected users block that indicates any users of the application currently on-line in the WAN.

3. The user interface of claim 1, further including a management icon that allows at least one of adding, editing, and deleting users of the application.

4. The user interface of claim 3, wherein the management icon is accessible only if the user has a predetermined authority.

5. The user interface of claim 1, further including an import menu icon for importing a predetermined file over the WAN.

6. The user interface of claim 5, wherein the predetermined file includes a mask image.

7. The user interface of claim 6, wherein a screen activated by the import menu icon requests at least one of a file name, a mask identification number, and a defect identification number.

8. The user interface of claim 1, further including an edit icon for at least one of reviewing, entering, and editing information regarding at least one of a stepper, a photoresist, and an etching process.

9. The user interface of claim 8, wherein the edit icon provides access to a diagram of the stepper.

10. The user interface of claim 8, wherein the edit icon provides access to default values for at least one of the stepper, the photoresist, and the etching process.

11. The user interface of claim 1, further including a simulation icon for initiating a simulation.

12. The user interface of claim 11, wherein the simulation icon further includes means for identifying an image to be simulated.

13. The user interface of claim 12, wherein the simulation icon further includes means for allowing simulated images to be moved in three-dimensional directions.

14. The user interface of claim 12, wherein the simulation icon further includes means for generating a one-dimensional plot from the image.

15. The user interface of claim 14, wherein the one-dimensional plot includes at least one of a graph plotting aerial image intensity versus position and a graph plotting process latitudes.

16. The user interface of claim 15, wherein the image includes a defect image and a reference image corresponding to the defect image.

17. The user interface of claim 16, wherein the simulation icon further includes means for comparing a simulated defect image and a simulated reference image.

18. The user interface of claim 12, wherein the simulation icon further includes means for creating at least one of a simulation template and a test template.

19. The user interface of claim 18, wherein the means for creating includes means for generating a script for a predetermined simulation.

20. The user interface of claim 18, wherein the means for creating includes means for generating a script for a predetermined test.