Compensating for effects of non-isotropic gas mixtures in interferometers

• US 20030128369A1
• Filed: 12/03/2002
• Published: 07/10/2003
• Est. Priority Date: 12/03/2001
• Status: Active Grant

• Current Assignee: Zygo Corporation (Ametek Incorporated)
• Original Assignee: Zygo Corporation (Ametek Incorporated)
• Inventors: Hill, Henry A.
• Granted Patent: US 7,042,574 B2
• Time in Patent Office: Days
• US Class Current: 356/517
• CPC Class Codes: G01B 2290/45 Multiple detectors for detecting interferometer signals
• CPC Class Codes: G01B 2290/60 Reference interferometer, i.e. additional interferometer not interacting with object
• CPC Class Codes: G01B 2290/70 Using polarization in the interferometer
• CPC Class Codes: G01B 9/02003 using beat frequencies
• CPC Class Codes: G01B 9/02052 Protecting, e.g. shock absorbing, arrangements
• CPC Class Codes: G01B 9/0207 Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer

Abstract

Methods and apparatus for reducing the effects of non-isotropic gas distributions on interferometry measurements are disclosed.

Claims

1. A method, comprising:

making an interferometry measurement in a chamber, the chamber having an atmosphere that has a first value of an intrinsic refractive property;

introducing a secondary gas into the chamber to adjust a composition of the chamber atmosphere; and

introducing a compensating gas into the chamber,

wherein the compensating gas reduces variations in the intrinsic refractive property of the atmosphere from the first value caused by the introduction of the secondary gas.

2. The method of claim 1, wherein the interferometry measurement measures the position of a movable stage in the chamber.

3. The method of claim 1, wherein the interferometry measurement comprises:

deriving a measurement beam and a reference beam from an input beam having a first wavelength;

directing the measurement beam to reflect from a measurement object;

overlapping the reflected measurement beam with the reference beam; and

detecting an intensity of the overlapping reflected measurement beam and reference beam.

4. The method of claim 1, wherein the compensating gas is introduced into the chamber while introducing the secondary gas.

5. The method of claim 1, further comprising flowing a background gas through the chamber, wherein the chamber atmosphere comprises the background gas.

6. The method of claim 5, wherein introducing the secondary gas into the chamber comprises adding the secondary gas to the background gas prior to flowing the background gas through the chamber.

7. The method of claim 5, wherein introducing the compensating gas into the chamber comprises adding the compensating gas to the background gas prior to flowing the background gas through the chamber.

8. The method of claim 1, wherein introducing the secondary and compensating gases comprises introducing a gas mixture into the chamber, the gas mixture comprising the secondary gas and the compensating gas.

9. The method of claim 8, wherein introducing the gas mixture comprises leaking the gas mixture into the chamber.

10. The method of claim 9, wherein the gas mixture leaks into the chamber from an air bearing.

11. The method of claim 1, wherein the chamber houses a photolithography exposure apparatus.

12. The method of claim 11, wherein interferometric measurement and secondary gas introduction occur during an exposure cycle of the photolithography exposure apparatus.

13. The method of claim 1, wherein the chamber houses a beam writing apparatus.

14. The method of claim 1, wherein the intrinsic refractive property is a specific gas refractivity.

15. The method of claim 14, wherein the chamber atmosphere comprises a background gas having a specific refractivity (n₁−

1)_s at a first wavelength, the secondary gas having a specific refractivity (n₂−

1)_s at the first wavelength, and the compensating gas having a specific refractivity (n₃−

1)_s at the first wavelength, and wherein (n₁−

1)_s≠

(n₂−

1)_s.

16. The method of claim 15, wherein (n₁−

1)_s>

(n₂−

1)_s and (n₃−

1)_s>

(n₁−

1)_s.

17. The method of claim 15, wherein (n₁−

1)_s<

(n₂−

1)_s and (n₃−

1)_s<

(n₁−

1)_s.

18. The method of claim 15, wherein the secondary gas has fractional partial pressure, x₂, and the compensating gas has a fractional partial pressure, x₃, and

19. The method of claim 1, wherein the interferometry measurement is a dispersive interferometric measurement.

20. The method of claim 19, wherein the intrinsic refractive property is a reciprocal dispersive power.

21. The method of claim 20, wherein a fractional partial pressure of the compensation gas is related to a fractional partial pressure of the secondary gas based on a specific refractivity of the secondary and compensation gases at a first wavelength, λ

₁, and at a second wavelength, λ

₂.

22. The method of claim 21, wherein the atmosphere comprises a background gas, and a fractional partial pressure of the compensation gas is related to a fractional partial pressure of the secondary gas based on a reciprocal dispersive power of the background gas, a reciprocal dispersive power of the secondary gas, and a reciprocal dispersive power of the compensation gas.

23. The method of claim 22, wherein the secondary gas has fractional partial pressure, x₂, and the compensation gas has a fractional partial pressure, x₃, and

24. The method of claim 1, wherein the chamber atmosphere comprises air.

25. The method of claim 1, wherein the chamber atmosphere comprises nitrogen.

26. The method of claim 1, wherein the secondary gas comprises H₂O, O₂, a hydrocarbon, or mixtures thereof.

27. The method of claim 1, wherein the compensating gas comprises CO₂, NO₂, CH₃CH₃ or mixtures thereof.

28. The method of claim 1, further comprising measuring an intrinsic refractive property of the atmosphere at a location in the system, and correcting the interferometric measurement based on the measured intrinsic refractive property.

29. A system, comprising:

a movable stage;

an interferometry system configured to measure a position of the movable stage along a measurement path;

a chamber housing the movable stage and the interferometry system, the chamber having an atmosphere that has a first value of an intrinsic refractive property; and

secondary and compensating gas sources configured to introduce a secondary gas and compensating gas into the chamber,

wherein the compensating gas reduces variations in the intrinsic refractive property of the atmosphere from the first value caused by the introduction of the secondary gas.

30. The system of claim 29, further comprising photolithography exposure apparatus, the photolithography exposure apparatus being housed in the chamber.

31. The system of claim 30, wherein the photolithography exposure apparatus comprises an illumination source and during operation of the system the movable stage positions a wafer relative to the illumination source.

32. The system of claim 29, further comprising beam writing apparatus, the beam writing apparatus being housed in the chamber.

33. The system of claim 32, wherein the beam writing apparatus comprises a beam source and during operation of the system the movable stage positions a wafer relative to the beam source.

34. The system of claim 29, further comprising a gas inlet configured to introduce the secondary gas and the compensating gas into the chamber.

35. The system of claim 34, further comprising a gas manifold configured to direct secondary gas and compensating gas from the secondary gas source and compensating gas source to the gas inlet.

36. The system of claim 35, further comprising a background gas source configured to introduce a background gas into the chamber, wherein the chamber atmosphere comprises the background gas.

37. The system of claim 36, wherein the gas manifold is further configured to direct the background gas from the background gas source to the gas inlet.

38. The system of claim 36, wherein the secondary and compensating gases are added to the background gas prior to being introduced to the chamber.

39. The system of claim 29, further comprising a gas exhaust configured to exhaust gas out of the chamber.

40. The system of claim 29, further comprising air bearings configured to support the movable stage, wherein the air bearings are inflated with the secondary and compensating gases.

41. The system of claim 29, wherein the interferometry system comprises a refractometer configured to monitor a refractivity of the atmosphere at a first position within the chamber

42. The system of claim 29, wherein the interferometry system comprises a wavelength monitor configured to monitor a wavelength of a measurement beam used in the interferometry system.