System and method for determining reticle defect printability
First Claim
1. A computer program stored on a computer-readable medium for determining the printability of a defect on a reticle or photomask onto a substrate during processing of said substrate, said printability being determined from a defect review menu of said reticle or photomask prepared by an inspection machine and weighting factors related to a fabrication procedure used to produce said substrate, said computer program comprising:
- a. instructions for creating a pixel grid image of a portion of said reticle or photomask containing said defect identified in said defect review menu, said pixel grid image having a plurality of associated individual pixel images of said reticle or photomask;
b. instructions for assigning a gray scale value to each of said associated individual pixel images of said pixel grid image;
c. instructions for selecting a probable center pixel of said defect in said pixel grid image;
d. instructions for determining a polarity of said defect;
e. instructions for determining a region of physical extent of said defect; and
f. instructions for determining a transmissivity energy level of said region of physical extent of said defect.
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Abstract
A method and software program for determining printability of a defect on a reticle or photomask onto a substrate during processing. That is performed by creating a pixel grid image having a plurality of individual pixel images showing the defect. A gray scale value is assigned to each pixel image of the pixel grid image and a probable center pixel of the defect is selected. Then the polarity of the defect is determined, with a coarse center pixel of the defect optionally selected using the probable center defect and polarity of the defect. If a coarse center pixel is selected, then a fine center of the defect can optionally be selected from the coarse center pixel and polarity of the defect. From the center pixel the physical extent of the defect can be determined followed by the determination the transmissivity energy level of the physical extent of the defect. Optionally, the proximity of the defect to a pattern edge on the reticle or photomask can be determined using the physical extent and polarity of the defect. Then the printability of the defect can be determined from the transmissivity energy level of the defect and characteristics of the wafer fabrication process being used to produce the substrate from the reticle or photomask.
44 Citations
25 Claims
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1. A computer program stored on a computer-readable medium for determining the printability of a defect on a reticle or photomask onto a substrate during processing of said substrate, said printability being determined from a defect review menu of said reticle or photomask prepared by an inspection machine and weighting factors related to a fabrication procedure used to produce said substrate, said computer program comprising:
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a. instructions for creating a pixel grid image of a portion of said reticle or photomask containing said defect identified in said defect review menu, said pixel grid image having a plurality of associated individual pixel images of said reticle or photomask;
b. instructions for assigning a gray scale value to each of said associated individual pixel images of said pixel grid image;
c. instructions for selecting a probable center pixel of said defect in said pixel grid image;
d. instructions for determining a polarity of said defect;
e. instructions for determining a region of physical extent of said defect; and
f. instructions for determining a transmissivity energy level of said region of physical extent of said defect. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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23. A computer program stored on a computer-readable medium for determining the printability of a defect on a reticle or photomask onto a substrate during processing of said substrate, said printability being determined from a defect review menu of said reticle or photomask prepared by an inspection machine and weighting factors related to a fabrication process used to produce said substrate, said computer program comprising:
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a. instructions for creating a pixel grid image of a portion of said reticle or photomask containing said defect identified in said defect review menu, said pixel grid image having a plurality of associated individual pixel images of said reticle or photomask;
b. instructions for assigning a gray scale value to each of said associated individual pixel images of said pixel grid image;
c. instructions for selecting a probable center pixel of said defect in said pixel grid image;
d. instructions for determining a polarity of said defect;
e. instructions for determining a coarse center pixel of said defect using said probable center defect from and said polarity of said defect;
f. instructions for determining a fine center of said defect using said coarse center pixel and said polarity of said defect;
e. instructions for determining a region of physical extent of said defect;
f. instructions for determining a transmissivity energy level of said region of physical extent of said defect;
g. instructions for determining proximity of said defect to an edge of a pattern on said reticle or photomask using said region of physical extent of said defect and said polarity of said defect; and
h. instructions for determining printability of said defect by applying a weighting factor to said transmissivity energy level, said weighting factor being a combination of several variables contributed by a particular wafer fabrication process being used to produce said substrate using said reticle or photomask. - View Dependent Claims (24, 25)
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Specification