×

System and method for determining reticle defect printability

  • US 20030138138A1
  • Filed: 01/13/2003
  • Published: 07/24/2003
  • Est. Priority Date: 09/20/1996
  • Status: Abandoned Application
First Claim
Patent Images

1. A computer program stored on a computer-readable medium for determining the printability of a defect on a reticle or photomask onto a substrate during processing of said substrate, said printability being determined from a defect review menu of said reticle or photomask prepared by an inspection machine and weighting factors related to a fabrication procedure used to produce said substrate, said computer program comprising:

  • a. instructions for creating a pixel grid image of a portion of said reticle or photomask containing said defect identified in said defect review menu, said pixel grid image having a plurality of associated individual pixel images of said reticle or photomask;

    b. instructions for assigning a gray scale value to each of said associated individual pixel images of said pixel grid image;

    c. instructions for selecting a probable center pixel of said defect in said pixel grid image;

    d. instructions for determining a polarity of said defect;

    e. instructions for determining a region of physical extent of said defect; and

    f. instructions for determining a transmissivity energy level of said region of physical extent of said defect.

View all claims
  • 0 Assignments
Timeline View
Assignment View
    ×
    ×