Titanium oxide photocatalyst thin film and production method of titanium oxide photocatalyst thin film

• US 20030143437A1
• Filed: 01/28/2003
• Published: 07/31/2003
• Est. Priority Date: 01/31/2002
• Status: Abandoned Application

• Current Assignee: Toudai Tlo, Ltd., Fuji Xerox Company Limited (Xerox Holdings Corp.)
• Original Assignee: Fuji Xerox Company Limited (Xerox Holdings Corp.)
• Inventors: Ohtsu, Shigemi, Hashimoto, Kazuhito, Maruyama, Tatsuya, Akutsu, Eiichi
• Application Number:
  US10/352,200
• Publication Number:
  US 20030143437A1
• Time in Patent Office: Days
• US Class Current: 428/701
• CPC Class Codes: A01N 2300/00 Combinations or mixtures of active ingredients covered by classes A01N27/00 - A01N65/48 with other active or formulation relevant ingredients, e.g. specific carrier materials or surfactants, covered by classes A01N25/00 - A01N65/48
• CPC Class Codes: A01N 25/34 Shaped forms, e.g. sheets, not provided for in any other sub-group of this main group
• CPC Class Codes: A01N 59/00 Biocides, pest repellants or attractants, or plant growth regulators containing elements or inorganic compounds
• CPC Class Codes: A01N 59/16 Heavy metals; Compounds thereof
• CPC Class Codes: C03C 17/23 Oxides C03C17/02 takes precedence
• CPC Class Codes: C03C 17/3417 all coatings being oxide coatings
• CPC Class Codes: C03C 2217/212 TiO2
• CPC Class Codes: C03C 2217/71 Photocatalytic coatings
• CPC Class Codes: C23C 14/083 of refractory metals or yttrium
• CPC Class Codes: C23C 14/58 After-treatment

Abstract

The present invention provides a titanium oxide photocatalytic thin film having a surface layer containing silicon oxide and titanium oxide and a production method for producing a titanium oxide photocatalytic thin film having a surface layer containing silicon oxide and titanium oxide and comprising a step of radiating excimer beam to the titanium oxide thin film while heating substrate on which the titanium oxide thin film is disposed in vacuum or gas atmosphere in the presence of a silicon-including compound.

Claims

1. A titanium oxide photocatalytic thin film comprising a surface layer including silicon oxide and titanium oxide.

2. A titanium oxide photocatalytic thin film according to claim 1, wherein the titanium oxide photocatalytic thin film is disposed on a substrate.

3. A titanium oxide photocatalytic thin film according to claim 1, wherein the titanium oxide photocatalytic thin film is disposed on a substrate and at least one of a reflection prevention film and a protection film is disposed between the titanium oxide photocatalytic thin film and the substrate.

4. A titanium oxide photocatalytic thin film according to claim 1, wherein the film thickness of the titanium oxide photocatalytic thin film is in a range from 10 to 120 nm or 180 to 230 nm.

5. A production method of a titanium oxide photocatalytic thin film comprising a surface layer including silicon oxide and titanium oxide, the production method comprising the steps of:

forming a titanium oxide thin film on a substrate; and

radiating excimer beam to the titanium oxide thin film while heating the substrate in a vacuum or a gas atmosphere in the presence of a compound, which includes silicon.

6. A production method of a titanium oxide photocatalytic thin film according to claim 5, wherein the compound, which includes silicon, is a compound containing —

Si—

O—

bond.

7. A production method of a titanium oxide photocatalytic thin film according to claim 5, wherein the gas atmosphere is one of a reductive gas atmosphere and a nitrogen gas atmosphere.

8. A production method of a titanium oxide photocatalytic thin film according to claim 5, wherein the heating temperature of the substrate is in a range from room temperature to 300°

C.

9. A production method of a titanium oxide photocatalytic thin film according to claim 5, wherein the heating temperature of the substrate is in a range from 50°

C. to 230°

C.

10. A production method of a titanium oxide photocatalytic thin film according to claim 5, wherein the substrate comprises a plastic substrate and the substrate heating temperature is in a range from room temperature to the heat resistant temperature of the plastic substrate.

11. A production method of a titanium oxide photocatalytic thin film according to claim 5, further comprising the step of disposing a reflection prevention film between the titanium oxide thin film and the substrate.

12. A production method of a titanium oxide photocatalytic thin film according to claim 11, wherein the reflection prevention film comprises an inorganic oxide thin film.

13. A production method of a titanium oxide photocatalytic thin film according to claim 11, wherein the refractive index of the reflection prevention film is within a range from 1.5 to 2.3.

14. A production method of a titanium oxide photocatalytic thin film according to claim 11,

wherein the refractive index of the reflection prevention film is between the refractive index of the substrate and the refractive index of the titanium oxide photocatalytic thin film;

and

the optical film thickness, as expressed by a product of the film thickness and the refractive index of the reflection prevention film, is one of ¼

of a wavelength and a whole number multiple of ¼

of the wavelength, wherein the wavelength is in the vicinity of the center of the visible light range.

15. A production method of a titanium oxide photocatalytic thin film according to claim 11, wherein the optical film thickness of the reflection prevention film, as expressed by a product of the film thickness and the refractive index of the reflection prevention film, is in a range from 110 nm to 160 nm or 330 nm to 480 nm.

16. A production method of a titanium oxide photocatalytic thin film according to claim 5, further comprising a step of disposing a protection film between the titanium oxide thin film and the substrate wherein the substrate comprises a plastic substrate.

17. A production method of a titanium oxide photocatalytic thin film according to claim 16, wherein the protection film comprises an inorganic oxide thin film.

18. A production method of a titanium oxide photocatalytic thin film according to claim 17, wherein the inorganic oxide thin film is selected from a group consisting of an amorphous titanium oxide thin film, SnO₂ thin film, a SiO₂ thin film, and an ITO thin film.

19. A production method of a titanium oxide photocatalytic thin film according to claim 16, wherein the refractive index of the protection film is in a range from 1.4 to 2.3.

20. A production method of a titanium oxide photocatalytic thin film according to claim 16,

wherein the refractive index of the protection film is between the refractive index of the substrate and the refractive index of the titanium oxide photocatalytic thin film;

and

the optical film thickness, as expressed by a product of the film thickness and the refractive index of the protection film, is one of ¼

of a wavelength and a whole number multiple of ¼

of the wavelength, wherein the wavelength is in the vicinity of the center of the visible light range.