Novel method for forming polymer pattern

• US 20030153006A1
• Filed: 11/19/2002
• Published: 08/14/2003
• Est. Priority Date: 05/22/2000
• Status: Abandoned Application

• Current Assignee: Kabushiki Kaisya Advance
• Original Assignee: Kabushiki Kaisya Advance
• Inventors: Washizu, Masao, Kurosawa, Osamu
• Application Number:
  US10/276,906
• Publication Number:
  US 20030153006A1
• Time in Patent Office: Days
• US Class Current: 435/7.1
• CPC Class Codes: B01J 19/0046 Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides; Apparatus and devices for combinatorial chemistry or for making molecular arrays synthesis methods per se C40B50/00
• CPC Class Codes: B01J 2219/00306 Reactor vessels in a multiple arrangement
• CPC Class Codes: B01J 2219/00317 Microwell devices, i.e. having large numbers of wells
• CPC Class Codes: B01J 2219/00468 by manipulation of individual beads
• CPC Class Codes: B01J 2219/005 Beads
• CPC Class Codes: B01J 2219/00585 Parallel processes
• CPC Class Codes: B01J 2219/0059 Sequential processes
• CPC Class Codes: B01J 2219/00596 Solid-phase processes
• CPC Class Codes: B01J 2219/00605 the compounds being directly bound or immobilised to solid supports
• CPC Class Codes: B01J 2219/00659 Two-dimensional arrays
• CPC Class Codes: B01J 2219/00675 In-situ synthesis on the substrate
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: C40B 50/14 Solid phase synthesis, i.e. wherein one or more library building blocks are bound to a solid support during library creation; Particular methods of cleavage from the solid support
• CPC Class Codes: C40B 60/14 for creating libraries

Abstract

A method for forming a combinatorial polymer pattern, which comprises immersing a particulate carrier in monomer addition reactors successively in accordance with a predetermined order using a particle transporting means, to thereby prepare a particle having a polymer having a predetermined sequence bonded thereto, and arranging such particles systematically. The method is practiced by using a plurality of reactors, each of which is provided for a specific monomer, a device for controlling the transfer of particles between the reactors, and a device for arranging particles on a substrate.

Claims

1. A method for forming a combinatorial polymer pattern whereby different polymers synthesized with a plurality of monomer types in various sequences are immobilized on a wafer in a specific pattern, the method comprising the steps of:

(1) preparing a plurality of reactors each containing a different monomer, a particle transfer control device for controlling transfer of particles between the reactors and a device for arranging the particles on a wafer,

(2) controlling the transport of the particles as carriers by said particle transfer control device for their immersion in the reactors according to a predetermined order, to synthesize polymers having predetermined sequences on the carrier particle surfaces, and

(3) arranging the particles obtained in step (2) on a wafer to form a pattern of polymers having various sequences on said wafer.

2. A method for forming a polymer pattern according to claim 1, wherein said polymer is an oligonucleotide.

3. A method for forming a polymer pattern according to claim 1, wherein said polymer is a peptide.

4. A method for forming a polymer pattern according to claim 1, wherein said carrier particles are spherical.

5. A method for forming a polymer pattern according to claim 1, wherein said carrier particles are magnetic bodies.

6. A method for forming a polymer pattern according to claim 1, wherein said particle transfer is accomplished along a channel or guide groove formed on the substrate.

7. A method for forming a polymer pattern according to claim 1, wherein said particle transfer is accomplished by transporting of the magnetic carrier particles by magnetic force.

8. A method for forming a polymer pattern according to claim 1, wherein there are provided on said substrate branched channels or guide grooves and deflecting devices therein to control movement of the particles, and the order of soak in the reactors is selected by switching the route followed by the particles.

9. A method for forming a polymer pattern according to claim 1, wherein the wafer used has a regular uneven structure for arrangement of said carrier particles on the wafer.