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PLASMA PROCESSING SYSTEM WITH DYNAMIC GAS DISTRIBUTION CONTROL

  • US 20030155079A1
  • Filed: 11/15/1999
  • Published: 08/21/2003
  • Est. Priority Date: 11/15/1999
  • Status: Abandoned Application
First Claim
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1. A plasma processing system, said plasma processing system comprising:

  • a plasma processing chamber used to process a substrate; and

    a gas flow system coupled to said plasma processing chamber, said gas flow system controlling flow of input gas into at least two different regions of said plasma processing chamber.

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