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Enhanced macroparticle filter and cathode arc source

  • US 20030155230A1
  • Filed: 01/15/2003
  • Published: 08/21/2003
  • Est. Priority Date: 10/24/1997
  • Status: Active Grant
First Claim
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1. A cathode arc source for depositing a coating on a substrate, said source comprising:

  • an anode and a cathode station for a target; and

    a first filter comprising a filter duct having at least one bend and first magnetic means for steering plasma through the bend of the filter duct for removal of macroparticles from the plasma, wherein the apparatus further comprises a second filter located between the duct of the first filter and the substrate, for further removal of macroparticles from the plasma and comprising a baffle, an aperture through which plasma can pass and second magnetic means to provide a magnetic field locally enhanced in the region of the second filter for steering plasma through the aperture, and wherein the aperture in the second filter has an opening of less than 33% of the internal sectional area of the filter duct.

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