Enhanced macroparticle filter and cathode arc source
First Claim
1. A cathode arc source for depositing a coating on a substrate, said source comprising:
- an anode and a cathode station for a target; and
a first filter comprising a filter duct having at least one bend and first magnetic means for steering plasma through the bend of the filter duct for removal of macroparticles from the plasma, wherein the apparatus further comprises a second filter located between the duct of the first filter and the substrate, for further removal of macroparticles from the plasma and comprising a baffle, an aperture through which plasma can pass and second magnetic means to provide a magnetic field locally enhanced in the region of the second filter for steering plasma through the aperture, and wherein the aperture in the second filter has an opening of less than 33% of the internal sectional area of the filter duct.
2 Assignments
0 Petitions
Accused Products
Abstract
A cathode arc source for depositing a coating on a substrate has an anode and a cathode station for a target, a first filter means comprising a filter duct having at least one bend, and first magnetic means for steering plasma through the filter duct for removal of macroparticles from the plasma. The apparatus comprises a second filter (10) for further removal of macroparticles from the plasma, made up of a baffle (11), an aperture (12) through which plasma can pass and second magnetic means (13) for steering plasma through the aperture. The aperture size may be less than 33% of the duct sectional area at that point. The source can also include an ion beam generator. Also described is a method of depositing coatings of ions using the second filter and closing the aperture in the filter when required.
12 Citations
35 Claims
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1. A cathode arc source for depositing a coating on a substrate, said source comprising:
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an anode and a cathode station for a target; and
a first filter comprising a filter duct having at least one bend and first magnetic means for steering plasma through the bend of the filter duct for removal of macroparticles from the plasma, wherein the apparatus further comprises a second filter located between the duct of the first filter and the substrate, for further removal of macroparticles from the plasma and comprising a baffle, an aperture through which plasma can pass and second magnetic means to provide a magnetic field locally enhanced in the region of the second filter for steering plasma through the aperture, and wherein the aperture in the second filter has an opening of less than 33% of the internal sectional area of the filter duct. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A method of filtering macroparticles from a beam of plasma emitted from a cathode arc source, the method comprising:
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using a magnetic field to steer the beam through a first filter comprising a filter duct having at least one bend; and
steering the beam thereafter through a second filter comprising a baffle and an aperture wherein a magnetic field is provided that is locally enhanced in the region of the second filter so as to steer the beam through the aperture, wherein the aperture in the second filter has an opening of less than 33% of the internal sectional area of the filter duct. - View Dependent Claims (17, 18, 19, 20)
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21. A filter for use in a deposition apparatus having a cathode arc source, a filter duct and a deposition chamber, the filter comprising:
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a baffle plate having an aperture therethrough; and
magnetic field generating means for guiding plasma from the cathode arc source through the aperture, wherein the aperture in the filter has an opening of less than 33% of the internal sectional area of the filter duct. - View Dependent Claims (22, 23, 24, 25, 26, 27)
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28. An apparatus for generating plasma for deposition upon a substrate, said apparatus comprising:
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a main plasma duct, a first cathode arc source, a first side duct connected to said main plasma duct, a second cathode arc source; and
a second side duct connected to said main plasma duct, wherein plasma output from the first cathode arc source is guided by magnetic field into the main plasma duct via the first side duct and plasma output from the second cathode arc source is guided by magnetic field into the main plasma duct via the second side duct, and wherein the main plasma duct provides a single plasma output from the apparatus. - View Dependent Claims (29, 30, 31, 32)
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33. A method of depositing a coating on a substrate, comprising:
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outputting a first plasma beam from a first cathode arc source;
guiding said first plasma beam through a first side duct into a main duct;
outputting a second plasma beam from a second cathode arc source;
guiding said second plasma beam through a second side duct into the main duct;
in the main duct, combining said first and second plasma beams to form a combined beam; and
guiding the combined beam onto the substrate. - View Dependent Claims (34, 35)
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Specification