Carbon doped GaAsSb suitable for use in tunnel junctions of long-wavelength VCSELs
First Claim
1. A method of fabricating GaAs(1−
- x)Sbx layers, comprising;
locating a substrate in an MOCVD chamber;
setting a temperature of the MOCVD chamber between 500°
C. and 650°
C.; and
growing GaAs(1−
x)Sbx on the substrate using an MOCVD process in which a source of Ga, a source of Sb, and a source of As are present.
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Accused Products
Abstract
GaAs(1−x)Sbx layers are grown by MOCVD. For lattice matching with InP, x is set to 0.5, while beneficial alternatives include setting x to 0.23, 0.3, and 0.4. During MOVCD, TMGa (or TEGa), TMSb, and AsH3 (or TBAs) are used to fabricate the GaAs(1−x )Sbx layer. Beneficially, the GaAs(1−x)Sbx layer'"'"'s composition is controlled by the ratio of As to Sb. The MOCVD growth temperature is between 500° C. and 650° C. The GaAs(1−x)Sbx layer is beneficially doped using CCl4 or CBr4. A heavily doped GaAs(1−x)Sbx layer can be used to form a tunnel junction with n-doped layers of InP, AlInAs, or with lower bandgap materials such as AlInGaAs or InGaAsP. Such tunnel junctions are useful for producing long wavelength VCSELs.
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Citations
20 Claims
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1. A method of fabricating GaAs(1−
- x)Sbx layers, comprising;
locating a substrate in an MOCVD chamber;
setting a temperature of the MOCVD chamber between 500°
C. and 650°
C.; and
growing GaAs(1−
x)Sbx on the substrate using an MOCVD process in which a source of Ga, a source of Sb, and a source of As are present. - View Dependent Claims (2, 3, 4, 5, 6, 7)
- x)Sbx layers, comprising;
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8. A tunnel junction having of a p-doped GaAs(1−
- x)Sbx layer.
- View Dependent Claims (9, 10, 11, 12)
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13. A vertical cavity surface emitting laser, comprising:
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an active region having a plurality of quantum wells, and a tunnel junction over said active region, wherein said tunnel junction includes a GaAs(1−
x)Sbx layer. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20)
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Specification