Substrate processing apparatus

• US 20030159307A1
• Filed: 02/28/2003
• Published: 08/28/2003
• Est. Priority Date: 02/28/2002
• Status: Active Grant

• Current Assignee: Canon Anelva Corporation (Canon Inc.)
• Original Assignee: Anelva Corporation (Canon Inc.)
• Inventors: Kaneko, Kazuaki, Ikeda, Masayoshi, Okada, Takuji, Sago, Yasumi
• Granted Patent: US 7,513,063 B2
• Time in Patent Office: Days
• US Class Current: 34/107
• CPC Class Codes: H01L 21/67017 Apparatus for fluid treatment H01L21/67126, H01L21/6715 take precedence
• CPC Class Codes: H01L 21/67109 mainly by convection

Abstract

The object of this invention is to realize a heat exchanger which efficiently and uniformly cools or heats portions to be controlled to a prescribed temperature, and then to provide a surface processing apparatus which makes it possible to continuously carry out stable processing. A surface processing apparatus comprises a substrate holder for holding a substrate and a gas emitting means arranged to face the substrate holder in a process chamber equipped with a gas introduction means connected to the gas emitting means and an exhaust gas means, to process a substrate with a gas or its reaction product emitted from the gas emitting means toward the substrate, wherein at least one of the substrate holder, the gas emitting means, and the process chamber has a heat exchanger, and the exchanger is constructed by arranging partition walls between two plates to form a fluid channel and a fin parallel with the channel or inclined by a prescribed angle on each of the two plates insides the channel so that the plate or a member in contact with the plate is cooled or heated with the fluid flowing through the channel.

Claims

1. A surface processing apparatus comprising a substrate holder for holding a substrate and a gas emitting means arranged to face said substrate holder in a process chamber equipped with a gas introduction means connected to said gas emitting means and an exhaust means, to process a substrate with a gas or its reaction product emitted from said gas emitting means toward the substrate,

wherein at least one of said substrate holder, said gas emitting means, and said process chamber has a heat exchanger, and said exchanger is constructed by arranging partition walls between two plates to form a fluid channel and a fin parallel with said channel or inclined by a prescribed angle on each of said two plates insides said channel so that said plate or a member in contact with said plate is cooled or heated with a fluid flowing through said channel.

2. The surface processing apparatus according to claim 1, wherein protuberant portions are provided on at least one of said two plates, which serve as the partition walls to form said channel after said two plates are fixed.

3. The surface processing apparatus according to claim 1, wherein the fin arranged on one plate of said two plates is overlapped with that arranged on another plate, as seen from the perpendicular direction to the flow direction of fluid.

4. The surface processing apparatus according to claim 2, wherein the fin arranged on one plate of said two plates is overlapped with that arranged on another plate, as seen from the perpendicular direction to the flow direction of fluid.

5. The surface processing apparatus according to claim 1, wherein said channel has the same cross section area over the whole length and is uniformly arranged over the entire said plate.

6. The surface processing apparatus according to claim 3, wherein said channel has the same cross section area over the whole length and is uniformly arranged over the entire said plate.

7. The surface processing apparatus according to claim 1, wherein the cross section length of said channel is three times or more compared with that of the channel where no fins are arranged.

8. The surface processing apparatus according to claim 5, wherein the cross section length of said channel is three times or more compared with that of the channel where no fins are arranged.

9. The surface processing apparatus according to claim 1, wherein a connection fin which connects said two plates and is wider than said fin is provided in the channel.

10. The surface processing apparatus according to claim 7, wherein a connection fin which connects said two plates and is wider than said fin is provided in the channel.

11. The surface processing apparatus according to claim 8, wherein a connection fin which connects said two plates and is wider than said fin is provided in the channel.