Apparatus for and method of cleaning objects to be processed

• US 20030159718A1
• Filed: 12/13/2001
• Published: 08/28/2003
• Est. Priority Date: 09/27/1996
• Status: Active Grant

• Current Assignee: Kinya Ueno, Satoshi Nakashima, Yuji Kamikawa
• Original Assignee: Kinya Ueno, Satoshi Nakashima, Yuji Kamikawa
• Inventors: Nakashima, Satoshi, Kamikawa, Yuji, Ueno, Kinya
• Granted Patent: US 6,746,543 B2
• Time in Patent Office: Days
• US Class Current: 134/30
• CPC Class Codes: B08B 3/08 the liquid having chemical or dissolving effect substances used, see the relevant classes
• CPC Class Codes: H01L 21/67051 using mainly spraying means, e.g. nozzles
• CPC Class Codes: H01L 21/67057 with the semiconductor substrates being dipped in baths or vessels
• CPC Class Codes: Y10S 134/902 Semiconductor wafer

Abstract

A cleaning apparatus and a cleaning method for cleaning a object are provided. In the cleaning apparatus, a drying chamber 42 and a cleaning bath 41 are separated from each other up and down, respectively. Thus, a space in the drying chamber 42 can be insulated from a space of the cleaning bath 41 through rotary doors 59a and a slide door 72. In the cleaning method, a cleaning process in the cleaning bath 41 is carried out while sealing it by the rotary doors 59a. On the other hand, a drying process in the drying chamber 42 is accomplished while sealing and closing it by the slide door 72. Consequently, there is no possibility that, during the drying process, the object is subjected to a bad influence from a chemical treatment.

Claims

1. A cleaning apparatus for cleaning a object to be processed, said apparatus comprising:

a processing bath for storing processing liquid in which said object is immersed;

a drying chamber arranged above said processing bath and provided with an opening which is disposed between a body of said drying chamber and said processing bath and through which said object is transported, said opening being capable of closing;

transporting means for transporting said object between said processing bath and said drying chamber through said opening; and

means for filling said drying chamber with an atmosphere of organic solvent.

2. A cleaning apparatus as claimed in claim 1, wherein said opening further includes sealing means for sealing said drying chamber when said opening is closed.

3. A cleaning apparatus for cleaning a object to be processed, said apparatus comprising:

a processing bath for storing processing liquid in which said object is immersed;

a drying chamber arranged above said processing bath and provided with an opening which is disposed between a body of said drying chamber and said processing bath and through which said object is transported, said opening being capable of closing;

a retaining member for retaining said object;

a supporting member for supporting said retaining member from said drying chamber'"'"'s side, said supporting member being inserted into said processing bath through said opening in case of disposing said retaining member in said processing bath;

moving means for moving said object between said processing bath and said drying chamber by said supporting member;

first open and close means for opening and closing said opening, said first open and close means being constructed so as to seal said drying chamber at said first open and close means'"'"' closing condition;

second open and close means for opening and closing said opening, said second open and close means being constructed so as to close said opening while leaving a clearance allowing said supporting member to pass therethrough at said second open and close means'"'"' closing condition; and

means for filling said drying chamber with an atmosphere of organic solvent.

4. A cleaning apparatus for cleaning a object to be processed, said apparatus comprising:

a processing bath for storing processing liquid in which said object is immersed;

a drying chamber arranged above said processing bath and provided with an opening which is disposed between a body of said drying chamber and said processing bath and through which said object is transported, said opening being capable of closing;

a retaining member for retaining said object;

a supporting member for supporting said retaining member from said drying chamber'"'"'s side, said supporting member being inserted into said processing bath through said opening in case of disposing said retaining member in said processing bath;

moving means for moving said object between said processing bath and said drying chamber by said supporting member;

open and close means for opening and closing said opening, said open and close means being constructed so as to seal said drying chamber at a first closing mode of said

11. A cleaning method of cleaning a object to be processed, said cleaning method comprising the steps of:

(a) transporting said object from a drying chamber into a processing bath through a lower opening formed in said drying chamber while retaining said object by a retaining member supported on said drying chamber'"'"'s side;

(b) closing said lower opening;

(c) storing processing liquid in said processing bath before or after transporting said object from drying chamber into said processing bath and subsequent immersing said object in said processing liquid;

(d) opening said lower opening to transport said object from said processing bath into said drying chamber;

(e) closing said lower opening; and

(f) drying said object by an atmosphere of organic solvent in said drying chamber.

12. A cleaning method as claimed in claim 11, further comprising a step of filling up said drying chamber with inert gas after said object has been transported from an outside of said cleaning apparatus into said drying chamber, said step preceding the step (b).

13. A cleaning method as claimed in claim 11, wherein inert gas is supplied into said processing bath in any one of the steps (a) to (f).

14. A cleaning method as claimed in claim 11, wherein gas containing organic solvent is supplied into said processing bath before the step (d).

15. A cleaning method as claimed in claim 11, wherein gas containing organic solvent is supplied into said processing bath before and during the step (d).

16. A cleaning method as claimed in claim 11, wherein, in the step (b), said lower opening is closed while leaving a clearance for allowing said object to be carried from said drying chamber'"'"'s side.

17. A cleaning method as claimed in claim 11, wherein, in the step (e), said lower opening is closed to sealed up the drying chamber.

18. A cleaning method as claimed in claim 11, further comprising a step of blowing inert gas against said object on transportation from said processing bath into said drying chamber.

19. A cleaning method as claimed in claim 11 or 18, after executing the step (f), further comprising a step of blowing inert gas against said object in said drying chamber while decompressing said drying chamber.

20. A cleaning method as claimed in claim 11, 18 or 19, between the steps (b) and (d), further comprising a step of filling said drying chamber with an atmosphere of organic solvent.

21. A cleaning method as claimed in claim 11, 18, 19 or 20, wherein, said processing liquid stored in said processing bath is a cooled rinse.