Thin film coating having niobium-titanium layer
First Claim
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1. A substrate bearing a low-emissivity coating, the low-emissivity coating comprising, moving outwardly:
- a) a first film layer comprising a transparent dielectric material;
b) a second film layer comprising an infrared-reflective material;
c) a third, protective film layer comprising niobium and titanium; and
d) a fourth film layer comprising a transparent dielectric material.
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Abstract
The invention provides niobium-titanium films, coatings (e.g., low-emissivity coatings) comprising one or more niobium-titanium films, and substrates bearings such coatings. Methods of depositing niobium-titanium films are also provided.
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Citations
70 Claims
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1. A substrate bearing a low-emissivity coating, the low-emissivity coating comprising, moving outwardly:
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a) a first film layer comprising a transparent dielectric material;
b) a second film layer comprising an infrared-reflective material;
c) a third, protective film layer comprising niobium and titanium; and
d) a fourth film layer comprising a transparent dielectric material. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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- 20. A substrate bearing a low-emissivity coating that includes one or more infrared-reflective films, the low-emissivity coating including a protective niobium-titanium layer that is contiguous with a protected infrared-reflective film of the coating.
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30. A transparent substrate having a first index of refraction, the substrate bearing a low-emissivity coating comprising, moving outwardly:
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a) a transparent base layer comprising amorphous material having a second index of refraction that is substantially equal to the first index of refraction of the substrate;
b) a second film layer comprising a transparent dielectric material;
c) a third film layer comprising an infrared-reflective material;
d) a fourth, protective film layer comprising niobium and titanium; and
e) a fifth film layer comprising a transparent dielectric material. - View Dependent Claims (31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43)
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44. A substrate bearing a low-emissivity coating, the low-emissivity coating comprising, moving outwardly:
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a) a first film layer comprising a transparent dielectric material;
b) a second film layer comprising an infrared-reflective material;
d) an intermediate film region comprising at least three film layers;
f) a sixth film layer comprising an infrared-reflective material;
g) a seventh film layer comprising a transparent dielectric material;
wherein the low-emissivity coating includes a protective niobium-titanium layer that is contiguous either to said second film layer or to said sixth film layer. - View Dependent Claims (45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61)
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62. A substrate bearing a low-emissivity coating, the coating comprising, moving outwardly:
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a) a first film layer comprising an oxide of zinc and tin;
b) a second film layer comprising an oxide of zinc alone;
c) a third film layer comprising an infrared-reflective material;
d) a fourth film layer comprising niobium and titanium formed directly upon the third film layer;
e) a fifth film layer comprising an oxide of zinc alone;
f) a sixth film layer comprising an oxide of zinc and tin;
g) a seventh film layer comprising an oxide of zinc alone;
h) an eighth film layer comprising an infrared-reflective material;
i) a ninth film layer comprising niobium and titanium formed directly upon the eighth film layer;
j) a tenth film layer comprising an oxide of zinc alone;
k) an eleventh film layer comprising an oxide of zinc and tin; and
l) a twelfth film layer comprising a transparent dielectric material.
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63. A substrate bearing a low-emissivity coating, the low-emissivity coating comprising, moving outwardly from the substrate:
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a) a first film layer comprising an oxide of titanium;
b) a second film layer comprising an oxide of zinc alone;
c) a third film layer comprising an infrared-reflective material;
d) a fourth film layer comprising niobium and titanium formed directly upon the third film layer;
e) a fifth film layer comprising silicon nitride;
f) a sixth film layer comprising an oxide of zinc alone;
g) a seventh film layer comprising an infrared-reflective material;
h) an eighth film layer comprising niobium and titanium formed directly upon the seventh film layer; and
i) a ninth film layer comprising a transparent dielectric material.
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- 64. A method of depositing a niobium-titanium layer having abrasion resistance and resistance to color shifting during elevated temperature processing, the method comprising providing a niobium-containing sputtering target and a titanium-containing sputtering target, positioning both targets in a sputtering chamber having a sputtering cavity in which a controlled environment can be established, and delivering electric charge to both targets to sputter niobium and titanium onto a substrate having a major surface oriented toward both targets, thereby depositing niobium-titanium film upon said major surface of the substrate or upon a film layer previously deposited upon said major surface of the substrate.
Specification