Substrate for transparent electrodes
First Claim
1. A substrate for a transparent electrode, wherein two or more layers of different transparent conductive films are formed on a transparent substrate, and an upper layer transparent conductive film has a higher heat resistance than that of a lower layer transparent conductive film.
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Abstract
One object of the present invention is to provide a transparent electrode substrate with an ITO film formed thereon, used for example as the transparent electrode plate in a dye sensitized solar cell, for which the electrical resistance does not increase even when exposed to high temperatures of 300° C. or higher. In order to achieve the object, the present invention provides a substrate for a transparent electrode, wherein two or more layers of different transparent conductive films are formed on a transparent substrate, and an upper layer transparent conductive film has a higher heat resistance than that of a lower layer transparent conductive film.
27 Citations
26 Claims
- 1. A substrate for a transparent electrode, wherein two or more layers of different transparent conductive films are formed on a transparent substrate, and an upper layer transparent conductive film has a higher heat resistance than that of a lower layer transparent conductive film.
- 9. A substrate for a transparent electrode, wherein an indium tin oxide film is provided on a transparent substrate, a fluorine doped tin oxide film is provided on the indium tin oxide film, and the thickness of the indium tin oxide film is 100-1000 nm.
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13. A method of producing a substrate for a transparent electrode, wherein a film formation temperature of an indium tin oxide film is 280°
- C. or higher when producing the substrate for a transparent electrode by providing the indium tin oxide film on a transparent substrate by means of a spray pyrolysis deposition method and by providing a fluorine doped tin oxide film on the indium tin oxide film.
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14. A method of producing a substrate for a transparent electrode, wherein a film formation temperature of a fluorine doped tin oxide film is 360-440°
- C. when producing the substrate for a transparent electrode by providing an indium tin oxide film on a transparent substrate by means of a spray pyrolysis deposition method and by providing the fluorine doped tin oxide film on the indium tin oxide film.
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