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Plasma processing apparatus

  • US 20030173030A1
  • Filed: 01/10/2003
  • Published: 09/18/2003
  • Est. Priority Date: 07/11/2000
  • Status: Active Grant
First Claim
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1. A plasma processing apparatus comprising a processing vessel in which a susceptor for placing a target object thereon is arranged, a slot antenna opposed to said susceptor to supply an electromagnetic field into said processing vessel, and a first dielectric member opposed to a radiation surface of said slot antenna, characterized in that said slot antenna comprises a first conductive plate constituting the radiation surface, and a second conductive plate arranged on a side opposite to said susceptor when seen from said first conductive plate, and at least one of said first and second conductive plates inclines relative to said first dielectric member.

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