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Process and apparatus for removing a contaminant from a substrate

  • US 20030175626A1
  • Filed: 03/14/2002
  • Published: 09/18/2003
  • Est. Priority Date: 03/14/2002
  • Status: Active Grant
First Claim
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1. A process for removing a contaminant from a substrate comprising:

  • placing the substrate within a chamber, wherein the substrate includes a pseudoplastic material and the contaminant;

    exposing the pseudoplastic material to a supercritical fluid to remove at least part of the contaminant from the substrate; and

    removing the substrate from the chamber after exposing, wherein a shape of the pseudoplastic material, after removing, is not significantly changed when compared to the shape of the pseudoplastic material, before placing.

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