Plasma reactor with plural independently driven concentric coaxial waveguides

• US 20030178143A1
• Filed: 03/25/2002
• Published: 09/25/2003
• Est. Priority Date: 03/25/2002
• Status: Abandoned Application

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Perrin, Mark
• Application Number:
  US10/106,703
• Publication Number:
  US 20030178143A1
• Time in Patent Office: Days
• US Class Current: 156/345.41
• CPC Class Codes: H01J 37/32192 Microwave generated discharge H01J37/32357, H01J37/32366, H01J37/32394, H01J37/32403 take precedence

Abstract

A plasma reactor includes a vacuum chamber having an interior and a pedestal within the chamber for supporting a semiconductor wafer to be processed. Gas distribution apparatus introduces a process gas into said chamber. Power is applied to the chamber by plural concentric coaxial waveguides outside of said chamber having an axis of propagation pointing toward the interior of said chamber and establishing corresponding annular zones of radiation within said chamber. The reactor further includes apparatus that can apply different levels of electromagnetic radiation power to different ones of the plural concentric coaxial waveguides.

Claims

1. A plasma reactor comprising:

a vacuum chamber having an interior;

a pedestal within said chamber for supporting a workpiece to be processed;

gas distribution apparatus for introducing a process gas into said chamber;

plural concentric coaxial waveguides outside of said chamber and having an axis of propagation pointing toward the interior of said chamber and establishing corresponding annular zones of radiation within said chamber; and

plural electromagnetic wave power sources coupled to respective ones of said plural concentric waveguides, each of said plural electromagnetic wave power sources being adjustable relative to one another for adjustment of electromagnetic radiation power within each of said annular radiation zones of said chamber.

2. The reactor of claim 1 wherein said axis of propagation of said plural concentric coaxial waveguides coincides with an axis of symmetry of said pedestal, whereby said annular radiation zones correspond to annular zones over said workpiece.

3. The reactor of claim 1 wherein said plural concentric waveguides comprise:

a cylindrical center conductor extending along said propagation axis;

an inner cylindrical waveguide conductive wall concentric with said center conductor and defining an inner annular volume between said inner cylindrical waveguide and said center conductor;

an outer cylindrical waveguide conductive wall concentric with said inner cylindrical waveguide conductive wall and enclosing an outer annular conductive volume.

4. The reactor of claim 3 further comprising an intermediate cylindrical waveguide conductive wall between and concentric with said inner and outer cylindrical waveguide conductive walls, said intermediate cylindrical waveguide conductive wall defining an intermediate annular conductive volume between said intermediate and inner cylindrical conductive waveguide walls, said outer annular volume lying between said outer and intermediate cylindrical conductive walls.

5. The reactor of claim 3 further comprising:

plural wire radiators coupled to respective ones of said electromagnetic radiation power sources, said plural wire radiators extending into and terminated within the interior spaces enclosed by respective ones of said plural concentric waveguides.

6. The reactor of claim 5 wherein said plural wire radiators extend radially with respect to said coaxial waveguides.

7. The reactor of claim 5 wherein said plural wire radiators extend axially with respect to said coaxial waveguides.

8. The reactor of claim 5 wherein said plural wire radiators extend at angles between radial and axial directions with respect to said coaxial waveguides.

9. The reactor of claim 5 wherein said plural wire radiators are terminated within the annular volumes of respective ones of said concentric waveguides by open ends of said plural wire radiators.

10. The reactor of claim 5 wherein each of said plural wire radiators loops within the annular volume of the corresponding concentric waveguide and is terminated on an interior surface of the corresponding waveguide wall.

11. The reactor of claim 8 further comprising a window at an end of said plural concentric waveguides facing said chamber.

12. The reactor of claim 11 wherein said window forms a portion of a vacuum enclosure of said chamber.

13. The reactor of claim 11 wherein said window is formed of a dielectric material.

14. The reactor of claim 13 wherein said window comprises quartz.

15. The reactor of claim 11 further comprising annular walls enclosing ends of respective ones of said concentric cylindrical waveguides opposite from said window, whereby each waveguide extends from a corresponding one of said annular walls to said window.

16. The reactor of claim 11 further comprising conductive barriers separating said window into annular sections corresponding to said concentric cylindrical waveguides.

17. The reactor of claim 11 further comprising plural ring magnets within said window in registration with corresponding walls of said concentric cylindrical waveguides.

18. The reactor of claim 1 wherein said electromagnetic radiation power sources are microwave power sources.

19. The reactor of claim 1 wherein said electromagnetic radiation power sources are RF power sources.

20. The reactor of claim 1 wherein said plural concentric waveguides are of the same axial length.

21. The reactor of claim 1 wherein axial lengths of said plural concentric waveguides increase from the outermost to the innermost ones of said concentric waveguides.

29. The apparatus of claim 5 wherein said plural wire radiators are terminated within the annular volumes of respective ones of said concentric waveguides by open ends of said plural wire radiators.

22. A power applicator of a plasma reactor for processing a workpiece, said power applicator terminated in a window of said plasma reactor and comprising:

plural concentric coaxial waveguides having an axis of propagation pointing toward the interior of said reactor and establishing corresponding annular zones of radiation within said reactor; and

plural electromagnetic wave power sources coupled to respective ones of said plural concentric waveguides, each of said plural electromagnetic wave power sources being adjustable relative to one another for adjustment of electromagnetic radiation power within each of said annular radiation zones of said reactor.

23. The apparatus of claim 22 wherein said plural concentric waveguides comprise:

a cylindrical center conductor extending along said propagation axis;

an inner cylindrical waveguide conductive wall concentric with said center conductor and defining an inner annular volume between said inner cylindrical waveguide and said center conductor;

an outer cylindrical waveguide conductive wall concentric with said inner cylindrical waveguide conductive wall and enclosing an outer annular conductive volume.

24. The apparatus of claim 23 further comprising an intermediate cylindrical waveguide conductive wall between and concentric with said inner and outer cylindrical waveguide conductive walls, said intermediate cylindrical waveguide conductive wall defining an intermediate annular conductive volume between said intermediate and inner cylindrical conductive waveguide walls, said outer annular volume lying between said outer and intermediate cylindrical conductive walls.

25. The apparatus of claim 23 further comprising:

plural wire radiators coupled to respective ones of said electromagnetic radiation power sources, said plural wire radiators extending into and terminated within the interior spaces enclosed by respective ones of said plural concentric waveguides.

26. The apparatus of claim 25 wherein said plural wire radiators extend radially with respect to said coaxial waveguides.

27. The apparatus of claim 25 wherein said plural wire radiators extend axially with respect to said coaxial waveguides.

28. The apparatus of claim 25 wherein said plural wire radiators extend at angles between radial and axial directions with respect to said coaxial waveguides.

30. The apparatus of claim 25 wherein each of said plural wire radiators loops within the annular volume of the corresponding concentric waveguide and is terminated on an interior surface of the corresponding waveguide wall.

31. A plasma reactor comprising:

a vacuum chamber having an interior;

a pedestal within said chamber for supporting a workpiece to be processed;

gas distribution apparatus for introducing a process gas into said chamber;

plural concentric coaxial waveguides outside of said chamber and having an axis of propagation pointing toward the interior of said chamber and establishing corresponding annular zones of radiation within said chamber, each of said plural concentric waveguides having an annular input end facing away from said chamber for receiving electromagnetic radiation;

a single coaxial waveguide having an input end and an output end, the output end being coupled to the annular input end of each of said plural concentric coaxial waveguides;

an electromagnetic wave power source coupled to said single concentric waveguide.

32. The reactor of claim 31 wherein said annular input ends of the plural concentric waveguides have respective areas determining amounts of electromagnetic radiation power from said single coaxial waveguide apportioned to respective ones of said plural concentric waveguides.

33. The reactor of claim 32 wherein said plural concentric coaxial waveguides are conically shaped having a lesser radius near said single coaxial waveguide and a greater radius facing said chamber while said single waveguide is cylindrical.

34. The reactor of claim 32 further comprising movable elements whose positions determine areas of corresponding ones of said input ends of said plural concentric waveguides.

35. The reactor of claim 34 wherein said movable elements comprise mechanical shutters.

36. The reactor of claim 31 further comprising:

a single wire radiator having one end connected to said electromagnetic wave power source and another end inside an interior space of said single coaxial waveguide.

37. A plasma reactor comprising:

a vacuum chamber having an interior;

a pedestal within said chamber for supporting a workpiece to be processed;

gas distribution apparatus for introducing a process gas into said chamber;

plural concentric coaxial waveguides outside of said chamber and having an axis of propagation pointing toward the interior of said chamber and establishing corresponding annular zones of radiation within said chamber; and

means for applying different levels of electromagnetic radiation power to different ones of said plural concentric coaxial waveguides.

38. The reactor of claim 37 wherein said means for applying different levels of electromagnetic radiation power comprise:

plural electromagnetic wave power sources coupled to respective ones of said plural concentric waveguides, each of said plural electromagnetic wave power sources being adjustable relative to one another for adjustment of electromagnetic radiation power within each of said annular radiation zones of said chamber.

39. The reactor of claim 37 wherein each of said plural concentric waveguides has an annular input end facing away from said chamber for receiving electromagnetic radiation, said means for applying different levels of electromagnetic radiation power comprising:

a single coaxial waveguide having an input end and an output end, the output end being coupled to the annular input end of each of said plural concentric coaxial waveguides;

an electromagnetic wave power source coupled to said single concentric waveguide.

40. The reactor of claim 39 wherein said annular input ends of the plural concentric waveguides have respective areas determining amounts of electromagnetic radiation power from said single coaxial waveguide apportioned to respective ones of said plural concentric waveguides.

41. The reactor of claim 40 wherein said plural concentric coaxial waveguides are conically shaped having a lesser radius near said single coaxial waveguide and a greater radius facing said chamber while said single waveguide is cylindrical.